The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Oct. 08, 2013
Filed:
Dec. 15, 2010
Frank Staals, Eindhoven, NL;
Hans Van Der Laan, Veldhoven, NL;
Hans Butler, Best, NL;
Gerardus Carolus Johannus Hofmans, Eindhoven, NL;
Sven Gunnar Krister Magnusson, Veldhoven, NL;
Frank Staals, Eindhoven, NL;
Hans Van Der Laan, Veldhoven, NL;
Hans Butler, Best, NL;
Gerardus Carolus Johannus Hofmans, Eindhoven, NL;
Sven Gunnar Krister Magnusson, Veldhoven, NL;
ASML Netherlands B.V., Veldhoven, NL;
Abstract
Movements of a lithographic apparatus include dynamic positioning errors on one or more axes which cause corresponding errors which can be measured in the applied pattern. A test method includes operating the apparatus several times while deliberately imposing a relatively large dynamic positioning error at different specific frequencies and axes. Variations in the error in the applied pattern are measured for different frequencies and amplitudes of the injected error across a frequency band of interest for a given axis or axes. Calculation using said measurements and knowledge of the frequencies injected allows analysis of dynamic positioning error variations in frequency bands correlated with each injected error frequency.