The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jun. 04, 2019
Filed:
Jan. 19, 2018
Asml Netherlands B.v., Veldhoven, NL;
Adam Urbanczyk, Utrecht, NL;
Hans Van Der Laan, Veldhoven, NL;
Grzegorz Grzela, Utrecht, NL;
Alberto Da Costa Assafrao, Veldhoven, NL;
Chien-Hung Tseng, Eindhoven, NL;
Jay Jianhui Chen, Fremont, CA (US);
ASML Netherlands B.V., Veldhoven, NL;
Abstract
Disclosed is a process monitoring method, and an associated metrology apparatus. The method comprises: comparing measured target response spectral sequence data relating to the measurement response of actual targets to equivalent reference target response sequence data relating to a measurement response of the targets as designed; and performing a process monitoring action based on the comparison of said measured target response sequence data and reference target response sequence data. The method may also comprise determining stack parameters from the measured target response spectral sequence data and reference target response spectral sequence data.