The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Oct. 02, 2012
Filed:
Feb. 19, 2010
Marcel Mathijs Theodore Marie Dierichs, Venlo, NL;
Hans Van Der Laan, Veldhoven, NL;
Hendrikus Robertus Marie Van Greevenbroek, Eindhoven, NL;
Marcel Mathijs Theodore Marie Dierichs, Venlo, NL;
Hans Van Der Laan, Veldhoven, NL;
Hendrikus Robertus Marie Van Greevenbroek, Eindhoven, NL;
ASML Netherlands B.V., Vedlhoven, NL;
Abstract
A lithographic apparatus includes a radiation system having reflective optical elements constructed and arranged to condition a beam of radiation. The reflective optical elements include a first faceted mirror constructed and arranged to generate a plurality of source images on a second mirror. The lithographic apparatus also includes a facet mask constructed and arranged to selectively mask one or more of the facets of the first faceted mirror. The facet mask includes a masking blade selectively interposable into the beam.