The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Apr. 14, 2025
Filed:
Apr. 20, 2021
Asml Netherlands B.v., Veldhoven, NL;
Olger Victor Zwier, Eindhoven, NL;
Maurits Van Der Schaar, Eindhoven, NL;
Hilko Dirk Bos, Utrecht, NL;
Hans Van Der Laan, Veldhoven, NL;
S. M. Masudur Rahman Al Arif, Veldhoven, NL;
Henricus Wilhelmus Maria Van Buel, 's-Hertogenbosch, NL;
Armand Eugene Albert Koolen, Nuth, NL;
Victor Emanuel Calado, Rotterdam, NL;
Kaustuve Bhattacharyya, Veldhoven, NL;
Jin Lian, Veldhoven, NL;
Sebastianus Adrianus Goorden, Eindhoven, NL;
Hui Quan Lim, Eindhoven, NL;
ASML Netherlands B.V., Veldhoven, NL;
Abstract
Disclosed is a substrate and associated patterning device. The substrate comprises at least one target arrangement suitable for metrology of a lithographic process, the target arrangement comprising at least one pair of similar target regions which are arranged such that the target arrangement is, or at least the target regions for measurement in a single direction together are, centrosymmetric. A metrology method is also disclosed for measuring the substrate. A metrology method is also disclosed comprising which comprises measuring such a target arrangement and determining a value for a parameter of interest from the scattered radiation, while correcting for distortion of the metrology apparatus used.