Hui Quan Lim

Title: Innovations by Inventor Hui Quan Lim in Lithographic Metrology

Introduction

Hui Quan Lim is an innovative inventor based in Eindhoven, Netherlands. With a passion for advancing technology in the field of lithography, she has made significant contributions through her patented invention designed to enhance metrology methods used in lithographic processes.

Latest Patents

Hui Quan Lim holds a patent that focuses on a substrate comprising a target arrangement, which is associated with at least one patterning device. This invention includes a method for measuring the substrate using a unique metrology approach. The patent emphasizes a target arrangement that is centrosymmetric and features similar target regions, facilitating improved measurement accuracy in lithographic processes. Her work enables the extraction of parameter values from scattered radiation while compensating for any distortions in the metrology apparatus employed.

Career Highlights

Hui Quan Lim is affiliated with ASML Netherlands B.V., a leading company in the semiconductor industry known for its cutting-edge lithography equipment. Her role at ASML highlights her commitment to advancing technology that underpins modern manufacturing processes.

Collaborations

In her professional journey, Hui has collaborated with renowned colleagues such as Olger Victor Zwier and Maurits Van Der Schaar. Their collective expertise and insights have likely contributed to the success of her innovations and patents.

Conclusion

Hui Quan Lim exemplifies the spirit of innovation in the realm of lithographic metrology. With her patent and collaborative efforts, she is paving the way for advancements that will enhance efficiency and accuracy in semiconductor manufacturing. Her contributions emphasize the importance of continued innovation within this dynamic field.