Asml Netherlands B.v.

Hui Quan Lim

Armand Eugene Albert Koolen

Maurits Van Der Schaar

Simon Gijsbert Josephus Mathijssen

Kaustuve Bhattacharyya

Hans Van Der Laan

Sebastianus Adrianus Goorden

Henricus Wilhelmus Maria Van Buel

Jin Lian

Olger Victor Zwier

Victor Emanuel Calado

Hilko Dirk Bos

Amanda Elizabeth Anderson

S M Masudur Rahman Al Arif

Disclosed is a method of measuring a target on a substrate comprising: illuminating a target with measurement radiation comprising at least a first wavelength, collecting the resultant scattered radiation within a collection numerical aperture; and determining a parameter of interest from said scattered radiation. The target comprises a mediator periodic structure and at least a first target periodic structure each in a respective different layer on the substrate, wherein a pitch of at least the mediator periodic structure is below a single diffraction limit defined by the collection numerical aperture and a wavelength of said measurement radiation, such that said scattered radiation comprises double diffracted radiation, said double diffracted radiation comprising radiation having undergone two sequential same-order diffractions of opposite sign.

Substrate comprising a target arrangement, and associated at least one patterning device, lithographic method and metrology method

Disclosed is a substrate and associated patterning device. The substrate comprises at least one target arrangement suitable for metrology of a lithographic process, the target arrangement comprising at least one pair of similar target regions which are arranged such that the target arrangement is, or at least the target regions for measurement in a single direction together are, centrosymmetric. A metrology method is also disclosed for measuring the substrate. A metrology method is also disclosed comprising which comprises measuring such a target arrangement and determining a value for a parameter of interest from the scattered radiation, while correcting for distortion of the metrology apparatus used.

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Eindhoven, Netherlands

Hui Quan Lim