Company Filing History:
Years Active: 2025
Title: S M Masudur Rahman Al Arif: Innovator in Lithography
Introduction
S M Masudur Rahman Al Arif is a notable inventor based in Veldhoven, Netherlands. He has made significant contributions to the field of lithography, particularly through his innovative patent. His work is essential in advancing technologies related to substrate and patterning devices.
Latest Patents
Al Arif holds a patent for a substrate comprising a target arrangement, along with an associated patterning device, lithographic method, and metrology method. This patent discloses a substrate that includes at least one target arrangement suitable for metrology of a lithographic process. The target arrangement consists of at least one pair of similar target regions arranged in a centrosymmetric manner. Additionally, a metrology method is described for measuring the substrate, which involves determining a value for a parameter of interest from scattered radiation while correcting for distortion in the metrology apparatus used.
Career Highlights
Al Arif is currently employed at ASML Netherlands B.V., a leading company in the field of lithography and semiconductor manufacturing. His role at ASML allows him to contribute to cutting-edge technologies that are vital for the advancement of the semiconductor industry.
Collaborations
Some of his notable coworkers include Olger Victor Zwier and Maurits Van Der Schaar. Their collaboration enhances the innovative environment at ASML, fostering advancements in lithographic technologies.
Conclusion
S M Masudur Rahman Al Arif is a distinguished inventor whose work in lithography has made a significant impact on the industry. His patent and contributions at ASML reflect his commitment to innovation and excellence in technology.