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For the Inventor, By the Inventor

Veldhoven, Netherlands

Kaustuve Bhattacharyya

This inventor holds 57 USPTO granted patents and 7 published patent applications and 3 EPO patents, primarily in Metrology Methods. Top assignee: Asml Netherlands B.v.. Active years: 2014-2026.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Kaustuve Bhattacharyya. Retrieved from https://idiyas.com/inventor/kaustuve-bhattacharyya

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

USPTO Granted Patents = 57 

% Patents Active = 94.7

 

Average Co-Inventor Count = 3.6

ph-index = 5

Forward Citations = 106(Granted Patents)

Forward Citations (Not Self Cited) = 67(Dec 10, 2025)


Company Filing History:

goldMedal57 out of 5,070 
 
Asml Netherlands B.v.
 patents

Years Active: 2014-2026

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Areas of Expertise:
Metrology
Lithographic Methods
Inspection Apparatus
Overlay Techniques
Patterning Device
Recipe Selection
Target Structure
Alignment Measurement
Device Manufacturing
Local Uniformity Metric
Stack Difference Correction
Manufacturing Process Monitoring
57 patents (USPTO):Explore Patents
1. 12724354 - Method for inferring a local uniformity metric (2026-09-01),
2. 12429328 - Metrology method, target and substrate (2025-09-30),
3. 12276921 - Substrate comprising a target arrangement, and associated at least one patterning device, lithographic method and metrology method (2025-04-14),
4. 12204826 - Method and apparatus for inspection and metrology (2025-01-21),
5. 12189314 - Metrology method and associated metrology and lithographic apparatuses (2025-01-07),
6. 12189305 - Metrology method and apparatus and computer program (2025-01-07),
7. 12158435 - Illumination and detection apparatus for a metrology apparatus (2024-12-03),
8. 12130246 - Method for overlay metrology and apparatus thereof (2024-10-29),
9. 12061421 - Method and system for determining information about a target structure (2024-08-13),
10. 12032299 - Metrology method and associated metrology and lithographic apparatuses (2024-07-09),
11. 12032297 - Method for monitoring lithographic apparatus (2024-07-09),
12. 12013647 - Metrology method (2024-06-18),
13. 11886125 - Method for inferring a local uniformity metric (2024-01-30),
14. 11703772 - Recipe selection based on inter-recipe consistency (2023-07-18),
15. 11640116 - Metrology method, computer product and system (2023-05-02),

Title: Innovator Spotlight: Kaustuve Bhattacharyya

Introduction:

Meet Kaustuve Bhattacharyya, a prolific inventor based in Veldhoven, Netherlands, with an impressive portfolio of 48 patents. His ingenuity and contributions in the field of metrology and lithographic apparatuses have left a lasting impact on the industry.

Latest Patents:

Kaustuve Bhattacharyya's latest patents showcase his expertise in metrology and lithographic apparatuses. One of his groundbreaking inventions is a metrology method for measuring asymmetric deviations in structures on a substrate. This method involves intensity asymmetry values, phase offset values, and measurement corrections to accurately assess deviations.

Another patent highlights his work on monitoring lithographic apparatuses. By developing a model based on height variation data and performance data of substrates, Bhattacharyya's method efficiently determines parameters of lithographic apparatuses, ultimately enhancing their performance.

Career Highlights:

Currently associated with ASML Netherlands B.V., Kaustuve Bhattacharyya plays a pivotal role in driving innovation and technological advancements in the company. His extensive expertise and innovative solutions have significantly contributed to the success of ASML in the highly competitive industry.

Collaborations:

Within ASML Netherlands B.V., Kaustuve Bhattacharyya collaborates closely with notable coworkers such as Arie Jeffrey Den Boef and Maurits Van Der Schaar. Together, they form a dynamic team that shares a common goal of pushing boundaries and developing cutting-edge solutions in the field of metrology and lithographic apparatuses.

Conclusion:

Kaustuve Bhattacharyya's dedication to innovation and his remarkable contributions to the field of metrology and lithographic apparatuses exemplify his commitment to excellence. His patents reflect his passion for pushing the boundaries of technology, and his collaborations within ASML Netherlands B.V. highlight his collaborative spirit in driving impactful advancements in the industry.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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