The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Oct. 29, 2024
Filed:
Dec. 19, 2019
Applicant:
Asml Netherlands B.v., Veldhoven, NL;
Inventors:
Simon Gijsbert Josephus Mathijssen, Rosmalen, NL;
Arie Jeffrey Den Boef, Waalre, NL;
Kaustuve Bhattacharyya, Veldhoven, NL;
Assignee:
ASML Netherlands B.V., Veldhoven, NL;
Primary Examiner:
Int. Cl.
CPC ...
G01N 23/20 (2018.01); G03F 7/00 (2006.01); G06T 5/10 (2006.01);
U.S. Cl.
CPC ...
G01N 23/20 (2013.01); G03F 7/70633 (2013.01); G06T 5/10 (2013.01); G06T 2207/30148 (2013.01);
Abstract
A method includes receiving an image formed in a metrology apparatus wherein the image comprises at least the resulting effect of at least two diffraction orders, and processing the image wherein the processing comprises at least a filtering step, for example a Fourier filter. The process of applying a filter may be obtained also by placing an aperture in the detection branch of the metrology apparatus.