The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jan. 07, 2025
Filed:
Nov. 04, 2021
Asml Netherlands B.v., Veldhoven, NL;
Sebastianus Adrianus Goorden, Eindhoven, NL;
Simon Gijsbert Josephus Mathijssen, Rosmalen, NL;
Leendert Jan Karssemeijer, Hertogenbosch, NL;
Manouk Rijpstra, Eindhoven, NL;
Ralph Brinkhof, Vught, NL;
Kaustuve Bhattacharyya, Veldhoven, NL;
ASML NETHERLANDS B.V., Veldhoven, NL;
Abstract
A method for a metrology process, the method includes obtaining first measurement data relating to a first set of measurement conditions and determining a first measurement recipe based on the first measurement data. At least one performance indicator is determined from one or more components of the first measurement data obtained from a component analysis or statistical decomposition. Alternatively, at least one performance indicator is determined from a comparison of one or more first measurement values relating to the first measurement recipe and one or more second measurement values relating to a second measurement recipe, where second measurement recipe is different to the first measurement data and relates a second set of measurement conditions, the second set of measurement conditions being different to the first set of measurement conditions.