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For the Inventor, By the Inventor

Eindhoven, Netherlands

Jin Lian

USPTO Granted Patents = 12 

Average Co-Inventor Count = 4.1

ph-index = 1

Forward Citations = 4(Granted Patents)


Company Filing History:

goldMedal12 out of 4,892 
 
Asml Netherlands B.v.
 patents

Years Active: 2019-2025

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12 patents (USPTO):Explore Patents
1. 12346031 - Methods and patterning devices and apparatuses for measuring focus performance of a lithographic apparatus, device manufacturing method (2025-07-01),
2. 12326669 - Illumination apparatus and associated metrology and lithographic apparatuses (2025-06-10),
3. 12276921 - Substrate comprising a target arrangement, and associated at least one patterning device, lithographic method and metrology method (2025-04-14),
4. 11099489 - Method of measuring a parameter of a lithographic process, metrology apparatus (2021-08-24),
5. 11042100 - Measurement apparatus and method of measuring a target (2021-06-22),
6. 10908514 - Metrology apparatus, lithographic system, and method of measuring a structure (2021-02-02),
7. 10831107 - Method for of measuring a parameter relating to a structure formed using a lithographic process (2020-11-10),
8. 10788758 - Method of measuring a parameter of interest, device manufacturing method, metrology apparatus, and lithographic system (2020-09-29),
9. 10705437 - Metrology method and apparatus, computer program and lithographic system (2020-07-07),
10. 10656534 - Method of measuring, device manufacturing method, metrology apparatus, and lithographic system (2020-05-19),
11. 10444640 - Metrology apparatus, lithographic system, and method of measuring a structure (2019-10-15),
12. 10310389 - Method of measuring, device manufacturing method, metrology apparatus, and lithographic system (2019-06-04),

Title: Innovator Spotlight: Jin Lian's Trailblazing Path in Lithography

Introduction:

Jin Lian, a distinguished inventor based in Eindhoven, Netherlands, is reshaping the landscape of lithographic processes through his groundbreaking innovations. With a portfolio boasting nine patents, Jin Lian has cemented his position as a visionary in the realm of metrology apparatus and target measurement.

Latest Patents:

1. Method of Measuring a Parameter of a Lithographic Process: Jin Lian's patent introduces a novel approach to measuring a parameter of a lithographic process. By modifying the wavelength spectrum of radiation, this method achieves unparalleled accuracy, with the power spectral density of the radiation finely tuned for optimal results.

2. Measurement Apparatus and Method of Measuring a Target: Through this patent, Jin Lian unveils a cutting-edge measurement apparatus that utilizes an innovative optical system. By employing a programmable spatial light modulator, the apparatus can redirect light to form multiple images at distinct locations on the sensor, revolutionizing target measurements.

Career Highlights:

Jin Lian's professional journey has been anchored at ASML Netherlands B.V., a prominent leader in the semiconductor industry. Within this dynamic environment, Jin Lian has spearheaded numerous research initiatives, driving technological advancements and shaping the future of lithography.

Collaborations:

Collaborating with esteemed colleagues such as Nitesh Pandey and Duygu Akbulut, Jin Lian has synergized with industry experts to propel his innovations to new heights. Together, they have cultivated a culture of innovation and excellence, fostering a collaborative spirit that fuels groundbreaking discoveries.

Conclusion:

In conclusion, Jin Lian's inventive spirit and unwavering dedication to excellence have positioned him as a trailblazer in the field of lithography. His pioneering patents and collaborative efforts serve as a testament to his visionary approach, inspiring a new generation of innovators to push the boundaries of what is achievable in the realm of metrology apparatus and target measurement.

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