The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jul. 07, 2020
Filed:
Oct. 09, 2018
Asml Netherlands B.v., Veldhoven, NL;
Narjes Javaheri, Eindhoven, NL;
Mohammadreza Hajiahmadi, Rotterdam, NL;
Murat Bozkurt, Uden, NL;
Alberto Da Costa Assafrao, Veldhoven, NL;
Marc Johannes Noot, Eindhoven, NL;
Simon Gijsbert Josephus Mathijssen, Rosmalen, NL;
Jin Lian, Eindhoven, NL;
ASML Netherlands B.V, Veldhoven, NL;
Abstract
Disclosed is a method, and associated apparatuses, for measuring a parameter of interest relating to a structure having at least two layers. The method comprises illuminating the structure with measurement radiation and detecting scattered radiation having been scattered by said structure. The scattered radiation comprises normal and complementary higher diffraction orders. A scatterometry model which relates a scattered radiation parameter to at least a parameter of interest and an asymmetry model which relates the scattered radiation parameter to at least one asymmetry parameter are defined, the asymmetry parameter relating to one or more measurement system errors and/or an asymmetry in the target other than a misalignment between the two layers. A combination of the scatterometry model and asymmetry model is used to determine a system of equations, and the system of equations is then solved for the parameter of interest.