The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Aug. 24, 2021
Filed:
Dec. 12, 2019
Asml Netherlands B.v., Veldhoven, NL;
Hugo Augustinus Joseph Cramer, Eindhoven, NL;
Hilko Dirk Bos, Utrecht, NL;
Erik Johan Koop, Eindhoven, NL;
Armand Eugene Albert Koolen, Nuth, NL;
Han-Kwang Nienhuys, Utrecht, NL;
Alessandro Polo, Arendonk, BE;
Jin Lian, Eindhoven, NL;
Arie Jeffrey Den Boef, Waalre, NL;
ASML Netherlands B.V., Veldhoven, NL;
Abstract
The disclosure relates to measuring a parameter of a lithographic process and a metrology apparatus. In one arrangement, radiation from a radiation source is modified and used to illuminate a target formed on a substrate using the lithographic process. Radiation scattered from a target is detected and analyzing to determine the parameter. The modification of the radiation comprises modifying a wavelength spectrum of the radiation to have a local minimum between a global maximum and a local maximum, wherein the power spectral density of the radiation at the local minimum is less than 20% of the power spectral density of the radiation at the global maximum and the power spectral density of the radiation at the local maximum is at least 50% of the power spectral density of the radiation at the global maximum.