The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Apr. 28, 2020
Filed:
Nov. 09, 2017
Asml Netherlands B.v., Veldhoven, NL;
Aiqin Jiang, Schenectady, NY (US);
Arie Jeffrey Den Boef, Waalre, NL;
Kaustuve Bhattacharyya, Veldhoven, NL;
Hans Van Der Laan, Veldhoven, NL;
Bart Visser, Eindhoven, NL;
Martin Jacobus Johan Jak, 's-Hertogenbosch, NL;
ASML Netherlands B.V., Veldhoven, NL;
Abstract
A method including obtaining a fit of data for overlay of a metrology target for a patterning process as a function of a stack difference parameter of the metrology target; and using, by a hardware computer, a slope of the fit (i) to differentiate a metrology target measurement recipe from another metrology target measurement recipe, or (ii) calculate a corrected value of overlay, or (iii) to indicate that an overlay measurement value obtained using the metrology target should be used, or not be used, to configure or modify an aspect of the patterning process, or (iv) any combination selected from (i)-(iii).