This inventor holds 48 USPTO granted patents and 1 published patent application and 2 EPO patents, primarily in Lithographic Metrology. Top assignees: Asml Netherlands B.v., Koninklijke Philips Corporation N.v., Tp Vision Holding B.v.. Active years: 2008-2025.
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile
Location History:
- Eindhoven, NL (2008 - 2017)
- Veldhoven, NL (2018)
- 's-Hertogenboşch, NL (2020)
- 's-Hertogenbosch, NL (2017 - 2023)
Company Filing History:
42 out of 5,076 
5 out of 21,910 
1 out of 51 
Years Active: 2008-2025
Areas of Expertise:
Title: Innovator Spotlight: Martin Jacobus Johan Jak
Introduction: Meet Martin Jacobus Johan Jak, a prolific inventor hailing from 's-Hertogenbosch, Netherlands, with an impressive portfolio of 47 patents in his name. His groundbreaking innovations in metrology have significantly advanced the field of measuring characteristics of structures on substrates.
Latest Patents:
1. Metrology Apparatus and Method: Martin Jak's latest patent introduces a method and apparatus for accurately determining a characteristic of interest related to structures on a substrate. By analyzing the phase of illuminating radiation scattered by the structure, the method calculates the value for the characteristic directly. This innovation paves the way for precise and efficient metrology processes.
2. Metrology Method, Target, and Substrate: Another recent patent by Martin Jak focuses on a diffraction measurement target with unique design variations in sub-targets. These variations include different pitches, feature widths, and space widths, enhancing the accuracy and versatility of metrology measurements on substrates.
Career Highlights: Martin Jak has made significant contributions to the tech industry through his work at renowned companies such as ASML Netherlands B.V. and Koninklijke Philips Corporation N.V. His expertise and innovative spirit have led to the development of cutting-edge technologies that continue to shape the future of metrology and substrate analysis.
Collaborations: Throughout his career, Martin Jak has collaborated with esteemed colleagues, including Arie Jeffrey Den Boef and Kaustuve Bhattacharyya. Together, they have worked on various projects, sharing knowledge and expertise to push the boundaries of innovation in metrology.
Conclusion: Martin Jacobus Johan Jak's dedication to innovation and his relentless pursuit of excellence have positioned him as a leading figure in the field of metrology. With a remarkable track record of 47 patents and a history of successful collaborations, Martin Jak continues to inspire and drive advancements in substrate analysis and measurement technologies.
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile