The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Apr. 12, 2022

Filed:

Sep. 19, 2018
Applicant:

Asml Netherlands B.v., Veldhoven, NL;

Inventors:

Martin Jacobus Johan Jak, 's-Hertogenbosch, NL;

Simon Gijsbert Josephus Mathijssen, Rosmalen, NL;

Kaustuve Bhattacharyya, Veldhoven, NL;

Won-Jae Jang, Gyeonggi-do, KR;

Jinmoo Byun, Seoul, KR;

Assignee:

ASML Netherlands B.V., Veldhoven, NL;

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
G03F 7/20 (2006.01);
U.S. Cl.
CPC ...
G03F 7/70133 (2013.01); G03F 7/705 (2013.01); G03F 7/70091 (2013.01); G03F 7/70575 (2013.01); G03F 7/70633 (2013.01);
Abstract

A method to determine a patterning process parameter, the method comprising: for a target, calculating a first value for an intermediate parameter from data obtained by illuminating the target with radiation comprising a central wavelength; for the target, calculating a second value for the intermediate parameter from data obtained by illuminating the target with radiation comprising two different central wavelengths; and calculating a combined measurement for the patterning process parameter based on the first and second values for the intermediate parameter.


Find Patent Forward Citations

Loading…