The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Aug. 31, 2021
Filed:
Jan. 03, 2020
Applicant:
Asml Netherlands B.v., Veldhoven, NL;
Inventors:
Kaustuve Bhattacharyya, Veldhoven, NL;
Arie Jeffrey Den Boef, Waalre, NL;
Martin Jacobus Johan Jak, 's-Hertogenbosch, NL;
Assignee:
ASML Netherlands B.V., Veldhoven, NL;
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
G03F 7/20 (2006.01); G01B 11/24 (2006.01); G01B 11/30 (2006.01); G01N 21/47 (2006.01); G01N 21/88 (2006.01);
U.S. Cl.
CPC ...
G03F 7/70633 (2013.01); G03F 7/705 (2013.01); G01B 11/24 (2013.01); G01B 11/30 (2013.01); G01N 21/47 (2013.01); G01N 21/88 (2013.01); G02F 2202/023 (2013.01); G03F 7/70641 (2013.01);
Abstract
A method including evaluating a plurality of substrate measurement recipes for measurement of a metrology target processed using a patterning process, against stack sensitivity and overlay sensitivity, and selecting one or more substrate measurement recipes from the plurality of substrate measurement recipes that have a value of the stack sensitivity that meets or crosses a threshold and that have a value of the overlay sensitivity within a certain finite range from a maximum or minimum value of the overlay sensitivity.