The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Apr. 28, 2020
Filed:
May. 24, 2018
Asml Netherlands B.v., Veldhoven, NL;
Martin Jacobus Johan Jak, 's-Hertogenbosch, NL;
Richard Quintanilha, Eindhoven, NL;
Arie Jeffrey Den Boef, Waalre, NL;
Michael Kubis, Meerbusch, DE;
ASML Netherlands B.V., Veldhoven, NL;
Abstract
A method of determining an edge roughness parameter has the steps: () controlling a radiation system to provide a spot of radiation at a measurement position for receiving a substrate; () receiving a measurement signal from a sensor for measuring intensity of a forbidden diffraction order (such as a second order) being diffracted by a metrology target at the measurement position when the metrology target is illuminated by the spot of radiation, the metrology target comprising a repetitive pattern being configured by configuration of a linewidth/pitch ratio (of about 0.5) to control an amount of destructive interference that leads to forbidding of the diffraction order, the sensor being configured to provide the measurement signal based on the measured intensity; and () determining an edge roughness parameter based on the measured intensity of the forbidden diffraction order.