Düsseldorf, Germany

Michael Kubis

This inventor holds 27 USPTO granted patents, primarily in Metrology And Lithography. Top assignees: Asml Netherlands B.v., Infineon Technologies Ag, Lam Research Corporation. Active years: 2007-2023.


% Patents Active = 92.6

Average Co-Inventor Count = 6.2

ph-index = 6

Forward Citations = 186(Granted Patents)


Location History:

  • Dresden, DE (2007 - 2015)
  • Meerbusch, NL (2021)
  • Meerbusch, DE (2019 - 2022)
  • Düsseldorf, DE (2014 - 2023)

Company Filing History:


Years Active: 2007-2023

Loading Chart...
Areas of Expertise:
Metrology
Lithography
Inspection
Patterning Device
Device Manufacturing
Substrate
Overlay Measurement
Edge Roughness
Scatterometers
Processing Cell
Computer Program
27 patents (USPTO):Explore Patents

Title: The Innovative Journey of Michael Kubis

Introduction: Michael Kubis, a talented inventor hailing from Düsseldorf, Germany, has made significant contributions to the field of technology with his creative and groundbreaking ideas.

Latest Patents: Michael Kubis holds several patents in various technological domains, showcasing his versatility and ingenuity in inventing new solutions to complex problems.

Career Highlights: Throughout his career, Michael Kubis has demonstrated a keen eye for innovation, leading to the development of cutting-edge technologies that have revolutionized the industry. His dedication to pushing the boundaries of what is possible has earned him recognition as a visionary inventor.

Collaborations: Michael Kubis has collaborated with leading research institutions and tech companies to bring his inventions to life. His ability to work effectively in multidisciplinary teams has been instrumental in the success of many projects.

Conclusion: In conclusion, Michael Kubis stands as a shining example of an inventor who is not afraid to think outside the box and challenge the status quo. His passion for innovation and relentless pursuit of excellence continue to inspire the next generation of inventors and innovators.

Profile summary based on public USPTO records.
Please report any incorrect information to [email protected]
Loading…