The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Jun. 20, 2023

Filed:

Mar. 26, 2021
Applicant:

Asml Netherlands B.v., Veldhoven, NL;

Inventors:

Hans Van Der Laan, Veldhoven, NL;

Wim Tjibbo Tel, Helmond, NL;

Marinus Jochemsen, Sunnyvale, CA (US);

Stefan Hunsche, Santa Clara, CA (US);

Assignee:

ASML Netherlands B.V., Veldhoven, NL;

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
G03F 7/20 (2006.01); G06F 30/398 (2020.01); H01L 21/66 (2006.01); G03F 7/00 (2006.01);
U.S. Cl.
CPC ...
G03F 7/705 (2013.01); G03F 7/7065 (2013.01); G03F 7/70608 (2013.01); G03F 7/70616 (2013.01); G03F 7/70625 (2013.01); G06F 30/398 (2020.01); H01L 22/20 (2013.01); H01L 22/12 (2013.01);
Abstract

A process of selecting a measurement location, the process including: obtaining pattern data describing a pattern to be applied to substrates in a patterning process; obtaining a process characteristic measured during or following processing of a substrate, the process characteristic characterizing the processing of the substrate; determining a simulated result of the patterning process based on the pattern data and the process characteristic; and selecting a measurement location for the substrate based on the simulated result.


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