The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jan. 20, 2015
Filed:
May. 07, 2009
Wim Tjibbo Tel, Helmond, NL;
Hans Van Der Laan, Veldhoven, NL;
Cassandra May Owen, Chandler, AZ (US);
Todd J. Davis, Gilbert, AZ (US);
Todd David Hiar, Gilbert, AZ (US);
Theodore Allen Paxton, Chandler, AZ (US);
Wim Tjibbo Tel, Helmond, NL;
Hans Van Der Laan, Veldhoven, NL;
Cassandra May Owen, Chandler, AZ (US);
Todd J. Davis, Gilbert, AZ (US);
Todd David Hiar, Gilbert, AZ (US);
Theodore Allen Paxton, Chandler, AZ (US);
ASML Netherlands B.V., Veldhoven, NL;
Abstract
A lithographic apparatus can include the following devices: a patterning system, a projection system, and a radiation beam inspection device. The patterning system can be configured to provide a patterned radiation beam. The projection system can be configured to project the patterned radiation beam onto a target portion of a substrate. Further, the radiation beam inspection device can be configured to inspect at least a part of the patterned radiation beam. In a substrate exposure position, the projection system is configured to expose a pattern of radiation on the substrate using the patterned radiation beam and the radiation beam device is configured to move the reflecting device away from a light path of the patterned radiation beam. In a radiation beam inspection position, the radiation beam inspection device is configured to move the reflecting device into the light path of the patterned radiation beam.