The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jun. 27, 2017
Filed:
Jul. 20, 2012
Applicants:
Arno Jan Bleeker, Westerhoven, NL;
Laurentius Cornelius DE Winter, Vessem, NL;
Inventors:
Arno Jan Bleeker, Westerhoven, NL;
Laurentius Cornelius De Winter, Vessem, NL;
Assignee:
ASML NETHERLANDS B.V., Veldhoven, NL;
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
G03B 27/52 (2006.01); G03B 27/54 (2006.01); G03B 27/32 (2006.01); G03F 7/20 (2006.01);
U.S. Cl.
CPC ...
G03F 7/70608 (2013.01); G03F 7/70191 (2013.01); G03F 7/70291 (2013.01); G03F 7/70558 (2013.01);
Abstract
A lithographic apparatus is provided and configured to project a patterned beam of radiation onto a substrate. The apparatus has a measurement system to provide measurement data related to a thickness of a resist layer on the substrate, and a controller to control the operation of the lithographic apparatus such that a radiation intensity level in the patterned beam to be projected onto the substrate is controlled based on the measurement data.