The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Sep. 03, 2019
Filed:
May. 30, 2017
Asml Netherlands B.v., Veldhoven, NL;
Pieter Cristiaan De Groot, Heeze, NL;
Gerard Frans Jozef Schasfoort, Waalre, NL;
Maksym Yuriiovych Sladkov, Veldhoven, NL;
Manfred Petrus Johannes Maria Dikkers, Veldhoven, NL;
Jozef Maria Finders, Veldhoven, NL;
Pieter-Jan Van Zwol, Eindhoven, NL;
Johannes Jacobus Matheus Baselmans, Oirschot, NL;
Stefan Michael Bruno Baumer, Valkenswaard, NL;
Laurentius Cornelius De Winter, Vessem, NL;
Wouter Joep Engelen, Eindhoven, NL;
Marcus Adrianus Van De Kerkhof, Helmond, NL;
Robbert Jan Voogd, Achel, NL;
ASML Netherlands B.V., Veldhoven, NL;
Abstract
A patterning device comprising a reflective marker, wherein the marker comprises: a plurality of reflective regions configured to preferentially reflect radiation having a given wavelength; and a plurality of absorbing regions configured to preferentially absorb radiation having the given wavelength; wherein the absorbing and reflective regions are arranged to form a patterned radiation beam reflected from the marker when illuminated with radiation, and wherein the reflective regions comprise a roughened reflective surface, the roughened reflective surface being configured to diffuse radiation reflected from the reflective regions, and wherein the roughened reflective surface has a root mean squared roughness of about an eighth of the given wavelength or more.