Neerpelt, Belgium

Robbert Jan Voogd

This inventor holds 16 USPTO granted patents and 2 published patent applications, primarily in Lithography Technology. Top assignee: Asml Netherlands B.v.. Active years: 2015-2025.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Robbert Jan Voogd. Retrieved from https://idiyas.com/inventor/robbert-jan-voogd

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

Calculating rank
USPTO Granted Patents = 16 

% Patents Active = 100.0

Average Co-Inventor Count = 5.5

ph-index = 2

Forward Citations = 15(Granted Patents)


Location History:

  • Achel, BE (2019)
  • Achel, NL (2019 - 2020)
  • Neerpelt, BE (2015 - 2022)
  • Neerpelt, NL (2017 - 2023)

Company Filing History:


Years Active: 2015-2025

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Areas of Expertise:
Lithographic Apparatus
Patterning Device
Sensor System
Device Manufacturing
Lithographic Method
Patterning Technique
Sensor Technology
Lithography Process
Device Fabrication
Optical Lithography
Photoresist Application
Microfabrication
16 patents (USPTO):Explore Patents

Title: The Innovative Mind of Robbert Jan Voogd

Introduction:

Robbert Jan Voogd, a talented inventor hailing from Neerpelt, Belgium, has made significant contributions to the field of lithography with an impressive portfolio of 15 patents to his name. His groundbreaking work at ASML Netherlands B.V. has solidified his reputation as a visionary in the industry.

Latest Patents:

Among his recent patents is a cutting-edge lithographic apparatus and method, showcasing Voogd's expertise in developing advanced technologies. This invention features a substrate table designed to support a substrate with precision, along with innovative heating and temperature sensing elements for enhanced performance.

Career Highlights:

Voogd's journey in the world of innovation has been marked by a series of achievements, with each patent reflecting his commitment to pushing the boundaries of lithography. His dedication to research and development has led to the creation of groundbreaking solutions that have revolutionized the semiconductor manufacturing process.

Collaborations:

Collaborating with talented individuals such as Thibault Simon Mathieu Laurent and Bastiaan Andreas Wilhelmus Hubertus Knarren has further enriched Voogd's innovative endeavors. Together, they have combined their expertise to drive forward-thinking projects and achieve remarkable results in the field of lithography.

Conclusion:

Robbert Jan Voogd's relentless pursuit of excellence and passion for innovation continue to inspire the next generation of inventors and engineers. His ingenuity and creativity serve as a testament to the power of human imagination in shaping the future of technology.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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