Asml Netherlands B.v.

Robbert Jan Voogd

Thibault Simon Mathieu Laurent

Bastiaan Andreas Wilhelmus Hubertus Knarren

Johan Gertrudis Cornelis Kunnen

Johannes Henricus Wilhelmus Jacobs

Nicolaas Ten Kate

Joost Jeroen Ottens

Marinus Jan Remie

Giovanni Francisco Nino

Raymond Wilhelmus Louis Lafarre

Koen Steffens

Haico Victor Kok

Ruud Hendrikus Martinus Johannes Bloks

Takeshi Kaneko

Gregory Martin Mason Corcoran

Gerardus Adrianus Antonius Maria Kusters

Ramin Badie

Johannes Jacobus Matheus Baselmans

Marcus Adrianus Van De Kerkhof

Jozef Maria Finders

Pieter-Jan Van Zwol

Laurentius Cornelius De Winter

Wouter Joep Engelen

Pieter Cristiaan De Groot

Maksym Yuriiovych Sladkov

Gerard Frans Jozef Schasfoort

Manfred Petrus Johannes Maria Dikkers

Stefan Michael Bruno Baumer

Bearrach Moest

Jan Steven Christiaan Westerlaken

Yuri Johannes Gabriël Van De Vijver

Johannes Hubertus Antonius Van De Rijdt

Petrus Franciscus Van Gils

Allard Eelco Kooiker

Wilhelmus Jacobus Maria Rooijakkers

Johannes Antonius Maria Van De Wal

Wilhelmina Margareta Jozef Hurkens-Mertens

Yohann Bruno Yvon Teillet

A lithographic apparatus is disclosed that includes a substrate table configured to support a substrate on a substrate supporting area and a heater and/or temperature sensor on a surface adjacent the substrate supporting area.

Lithographic apparatus and method

A patterning device comprising a reflective marker, wherein the marker comprises: a plurality of reflective regions configured to preferentially reflect radiation having a given wavelength; and a plurality of absorbing regions configured to preferentially absorb radiation having the given wavelength; wherein the absorbing and reflective regions are arranged to form a patterned radiation beam reflected from the marker when illuminated with radiation, and wherein the reflective regions comprise a roughened reflective surface, the roughened reflective surface being configured to diffuse radiation reflected from the reflective regions, and wherein the roughened reflective surface has a root mean squared roughness of about an eighth of the given wavelength or more.

Patterning device

A substrate table to support a substrate on a substrate supporting area, the substrate table having a heat transfer fluid channel at least under the substrate supporting area, and a plurality of heaters and/or coolers to thermally control the heat transfer fluid in the channel at a location under the substrate supporting area.

An illumination system (IL) for a lithographic apparatus comprising a polarization adjustment apparatus () arranged to receive linearly polarized radiation, the polarization adjustment apparatus comprising regions which are configured to rotate the polarization orientation by different amounts, a directing apparatus () operable to direct the radiation through one or more regions of the polarization adjustment apparatus, a controller (CN) configured to control the directing apparatus so as to control which of the one or more regions of the polarization adjustment apparatus radiation is directed through, wherein the controller is configured to limit which of the regions radiation is directed through to one or more regions which rotate the orientation of the linear polarization by substantially the same amount, and a diffuser configured to receive radiation output from the polarization adjustment apparatus and increase a range of angles at which the radiation propagates while substantially conserving the polarization state of the radiation.

Lithographic method and apparatus

A sensor system to measure a physical quantity, the system including a parallel detection arrangement with multiple detectors to allow measurements in parallel at different spatial locations, wherein the multiple detectors share a noise source, wherein the sensor system is configured such that the multiple detectors each output a signal as a function of the physical quantity, and wherein the sensor system is configured such that at least one detector responds differently to noise originating from the shared noise source than the one or more other detectors.

Sensor system for lithography

A sensor for use in lithographic apparatus of an immersion type and which, in use, comes into contact with the immersion liquid is arranged so that the thermal resistance of a first heat path from a transducer of the sensor to a temperature conditioning device is less than the thermal resistance of a second heat flow path from the transducer to the immersion liquid. Thus, heat flow is preferentially towards the temperature conditioning device and not the immersion liquid so that temperature-induced disturbance in the immersion liquid is reduced or minimized.

Sensor, lithographic apparatus and device manufacturing method

Growing community of inventors

Neerpelt, Belgium

Robbert Jan Voogd