The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Sep. 05, 2017
Filed:
Mar. 19, 2013
Asml Netherlands B.v., Veldhoven, NL;
Thibault Simon Mathieu Laurent, Eindhoven, NL;
Johannes Henricus Wilhelmus Jacobs, Heeze, NL;
Haico Victor Kok, Veldhoven, NL;
Yuri Johannes Gabriël Van De Vijver, Best, NL;
Johannes Antonius Maria Van De Wal, Oirschot, NL;
Bastiaan Andreas Wilhelmus Hubertus Knarren, Nederweert-Eind, NL;
Robbert Jan Voogd, Neerpelt, NL;
Jan Steven Christiaan Westerlaken, Heesch, NL;
Johannes Hubertus Antonius Van De Rijdt, Gemert, NL;
Allard Eelco Kooiker, Waalre, NL;
Wilhelmina Margareta Jozef Hurkens-Mertens, Montfort, NL;
Yohann Bruno Yvon Teillet, Eindhoven, NL;
ASML Netherlands B.V., Veldhoven, NL;
Abstract
A sensor for use in lithographic apparatus of an immersion type and which, in use, comes into contact with the immersion liquid is arranged so that the thermal resistance of a first heat path from a transducer of the sensor to a temperature conditioning device is less than the thermal resistance of a second heat flow path from the transducer to the immersion liquid. Thus, heat flow is preferentially towards the temperature conditioning device and not the immersion liquid so that temperature-induced disturbance in the immersion liquid is reduced or minimized.