Best, Netherlands

Yuri Johannes Gabriël Van De Vijver

USPTO Granted Patents = 22 

 

Average Co-Inventor Count = 7.4

ph-index = 3

Forward Citations = 30(Granted Patents)


Company Filing History:


Years Active: 2008-2023

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22 patents (USPTO):

Title: Yuri Johannes Gabriël Van De Vijver: Inspiring Innovations in the World of Lithography

Introduction: Yuri Johannes Gabriël Van De Vijver, a prominent inventor based in Best, Netherlands, has left a remarkable legacy in the field of inventions, particularly in the domain of lithography. With 18 patents to his name, Van De Vijver's contributions continue to pave the way for future generations of inventors and innovators.

Latest Patents: Among his latest patents is a groundbreaking method for unloading a substrate in a lithographic apparatus. This method involves supplying gas to a gap between a support table and the substrate, with a unique approach of gas flow distribution for efficient unloading. Additionally, his innovative substrate holder design includes a liquid control structure to enhance liquid flow management during substrate support.

Career Highlights: Van De Vijver is affiliated with ASML Netherlands B.V., a leading company in the semiconductor manufacturing industry. His expertise and dedication have led to the successful development and implementation of cutting-edge lithographic technologies that have revolutionized the production processes in the industry.

Collaborations: Throughout his career, Van De Vijver has collaborated with esteemed colleagues such as Coen Hubertus Matheus Baltis and Bert Dirk Scholten. Together, they have worked on various projects, combining their skills and knowledge to drive innovation and advancement in the field of lithography.

Conclusion: Yuri Johannes Gabriël Van De Vijver's exceptional work in the realm of lithography stands as a testament to his ingenuity and passion for pushing the boundaries of invention. His patents and collaborative efforts have not only transformed the industry but have also inspired countless individuals to pursue their own creative endeavors in the world of innovations.

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