The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Dec. 02, 2014
Filed:
Aug. 25, 2008
Tjarko Adriaan Rudolf Van Empel, Eindhoven, NL;
Vadim Yevgenyevich Banine, Helmond, NL;
Vladimir Vitalevich Ivanov, Moscow, RU;
Erik Roelof Loopstra, Eindhoven, NL;
Johannes Hubertus Josephina Moors, Helmond, NL;
Jan Bernard Plechelmus Van Schoot, Eindhoven, NL;
Yuri Johannes Gabriël Van DE Vijver, Best, NL;
Gerardus Hubertus Petrus Maria Swinkels, Eindhoven, NL;
Hendrikus Gijsbertus Schimmel, Utrecht, NL;
Dzmitry Labetski, Eindhoven, NL;
Tjarko Adriaan Rudolf Van Empel, Eindhoven, NL;
Vadim Yevgenyevich Banine, Helmond, NL;
Vladimir Vitalevich Ivanov, Moscow, RU;
Erik Roelof Loopstra, Eindhoven, NL;
Johannes Hubertus Josephina Moors, Helmond, NL;
Jan Bernard Plechelmus Van Schoot, Eindhoven, NL;
Yuri Johannes Gabriël Van De Vijver, Best, NL;
Gerardus Hubertus Petrus Maria Swinkels, Eindhoven, NL;
Hendrikus Gijsbertus Schimmel, Utrecht, NL;
Dzmitry Labetski, Eindhoven, NL;
ASML Netherlands B.V., Veldhoven, NL;
Abstract
A module for producing extreme ultraviolet radiation includes a supply configured to supply droplets of an ignition material to a predetermined target ignition position and a laser arranged to be focused on the predetermined target ignition position and to produce a plasma by hitting such a droplet which is located at the predetermined target ignition position in order to change the droplet into an extreme ultraviolet producing plasma. Also, the module includes a collector mirror having a mirror surface constructed and arranged to reflect the radiation in order to focus the radiation on a focal point. A fluid supply is constructed and arranged to form a gas flow flowing away from the mirror surface in a direction transverse with respect to the mirror surface in order to mitigate particle debris produced by the plasma.