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For the Inventor, By the Inventor

Eindhoven, Netherlands

Jan Bernard Plechelmus Van Schoot

This inventor holds 45 USPTO granted patents and 3 published patent applications and 1 EPO patent, primarily in Lithographic Technology. Top assignees: Asml Netherlands B.v., Carl Zeiss Smt Gmbh, Carl-Zeiss-Smt Ag. Active years: 2004-2024.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Jan Bernard Plechelmus Van Schoot. Retrieved from https://idiyas.com/inventor/jan-bernard-plechelmus-van-schoot

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

Calculating rank
USPTO Granted Patents = 45 

% Patents Active = 71.1

 

Average Co-Inventor Count = 4.6

ph-index = 6

Forward Citations = 161(Granted Patents)


Location History:

  • Veldhoven, NL (2017 - 2019)
  • Eindhoven, NL (2004 - 2020)

Company Filing History:

goldMedal45 out of 5,087 
 
Asml Netherlands B.v.
 patents
silverMedal2 out of 1,489 
 
Carl Zeiss Smt Gmbh
 patents
bronzeMedal2 out of 461 
 
Carl-Zeiss-Smt Ag
 patents
where one patent can have more than one assignee

Years Active: 2004-2024

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Areas of Expertise:
Lithographic Apparatus
EUV Lithography
Radiation Source
Projection System
Illumination System
Optical Apparatus
Spectral Purity Filter
Device Manufacturing
Alignment Mechanism
Beam Conditioning
Extreme Ultraviolet
Multilayer Mirror
45 patents (USPTO):Explore Patents
1. 12099306 - Method for controlling a lithographic system (2024-09-24),
2. 10558126 - Lithographic apparatus and method (2020-02-11),
3. 10289006 - Beam delivery for EUV lithography (2019-05-14),
4. 10248027 - Projection system (2019-04-02),
5. 10001709 - Lithographic apparatus, spectral purity filter and device manufacturing method (2018-06-19),
6. 9989863 - Lithographic system (2018-06-05),
7. 9986628 - Method and apparatus for generating radiation (2018-05-29),
8. 9958787 - Lithographic method and apparatus (2018-05-01),
9. 9860966 - Radiation source (2018-01-02),
10. 9835950 - Radiation source (2017-12-05),
11. 9785051 - Actuation mechanism, optical apparatus, lithography apparatus and method of manufacturing devices (2017-10-10),
12. 9632419 - Radiation source (2017-04-25),
13. 9618859 - Lithographic apparatus and device manufacturing method (2017-04-11),
14. 9594306 - Lithographic apparatus, spectral purity filter and device manufacturing method (2017-03-14),
15. 9414477 - Radiation source, lithographic apparatus and device manufacturing method (2016-08-09),

Title: Jan Bernard Plechelmus Van Schoot: Pioneering Innovator in Lithographic Technology

Introduction: Jan Bernard Plechelmus Van Schoot is a renowned inventor hailing from Eindhoven, Netherlands, with an impressive portfolio of 44 patents to his name. His groundbreaking contributions in the field of lithographic technology have revolutionized the semiconductor industry.

Latest Patents: Van Schoot's latest patents include a "Lithographic apparatus and method," which features a support structure capable of handling EUV radiation beams with precision, and "Beam delivery for EUV lithography," showcasing advanced optics to optimize beam delivery in laser-produced plasma sources.

Career Highlights: Throughout his career, Van Schoot has made significant strides in lithography, particularly during his tenure at ASML Netherlands B.V. and Carl Zeiss SMT AG. His expertise in developing cutting-edge technologies for semiconductor manufacturing has solidified his reputation as a trailblazer in the industry.

Collaborations: Van Schoot has collaborated with top professionals in the field, including Erik Roelof Loopstra and Gerardus Hubertus Petrus Maria Swinkels. Together, they have pushed the boundaries of lithographic innovation, paving the way for future advancements in the semiconductor sector.

Conclusion: Jan Bernard Plechelmus Van Schoot's relentless pursuit of excellence and dedication to innovation have established him as a key figure in the world of lithographic technology. His patented inventions continue to shape the semiconductor industry, leaving a lasting impact on technological advancement worldwide.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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