Asml Netherlands B.v.

Carl Zeiss Smt Gmbh

Carl-Zeiss-Smt Ag

Jan Bernard Plechelmus Van Schoot

Erik Roelof Loopstra

Gerardus Hubertus Petrus Maria Swinkels

Andrei Mikhailovich Yakunin

Vadim Yevgenyevich Banine

Johannes Hubertus Josephina Moors

Antonius Johannes Josephus Van Dijsseldonk

Gosse Charles De Vries

Bob Streefkerk

Markus Franciscus Antonius Eurlings

Yuri Johannes Gabriël Van De Vijver

Hendrikus Gijsbertus Schimmel

Johannes Catharinus Hubertus Mulkens

Johannes Jacobus Matheus Baselmans

Jozef Maria Finders

Franciscus Johannes Joseph Janssen

Tjarko Adriaan Rudolf Van Empel

Dzmitry Labetski

Wilhelmus Petrus De Boeij

Adrianus Franciscus Petrus Engelen

Paul Graeupner

Antonius Theodorus Wilhelmus Kempen

Vladimir Vitalevich Ivanov

Koen Van Ingen Schenau

Hans Butler

Timotheus Franciscus Sengers

Hans Van Der Laan

Han-Kwang Nienhuys

Leon Martin Levasier

Edwin Johan Buis

Vladimir Mihailovitch Krivtsun

Olav Waldemar Vladimir Frijns

Marcio Alexandre Cano Miranda

Marinus Johannes Maria Van Dam

Martinus Agnes Willem Cuijpers

Danny Maria Hubertus Philips

Oscar Franciscus Jozephus Noordman

Robertus Johannes Marinus De Jongh

Diederik Jan Maas

Christiaan Louis Valentin

Hermanus Johannes Maria Kreuwel

Roger Wilhelmus Antonius Henricus Schmitz

Manish Ranjan

Oleg Voznyi

Alain Louis Claude Leroux

Albert Pieter Rijpma

Edgar Alberto Osorio Oliveros

Viacheslav Medvedev

Kursat Bal

Oleksiy Galaktionov

Hermanus Kreuwel

Sjoerd Nicolaas Lambertus Donders

Nicolaas Ten Kate

Michel Riepen

Koen Jacobus Johannes Maria Zaal

Martinus Cornelis Maria Verhagen

Hendricus Johannes Maria Meijer

Theodorus Petrus Maria Cadee

Christian Wagner

Sven Antoin Johan Hol

Ramon Pascal Van Gorkom

Heine Melle Mulder

Andrey Alexandrovich Nikipelov

Marinus Aart Van Den Brink

Adrianus Hendrik Koevoets

Wilhelmus Franciscus Johannes Simons

Laurentius Johannes Adrianus Van Bokhoven

Uwe Mickan

Maurice Willem Jozef Etiënne Wijckmans

Hako Botma

Alexander Matthijs Struycken

Bernhard Kneer

Nicolaas Aldegonda Jan Maria Van Aerle

Sascha Migura

Judocus Marie Dominicus Stoeldraijer

Fidelus Adrianus Boon

Michel Fransois Hubert Klaassen

Erik Maria Rekkers

Ivo Vanderhallen

Uwe Bruno Heini Stamm

Kevin Weimin Zhang

Paul Gräupner

Bert Pieter Van Drieënhuizen

Niek Antonius Jacobus Maria Kleemans

Carsten Andreas Kohler

Igor Petrus Maria Bouchoms

Roel Johannes Elisabeth Merry

Ramon Mark Hofstra

Rene Hubert Jacobus Carpaij

Marcel Dierichs

Maurice Henricus Franciscus Janssen

Michael Frederik Ypma

Leon Leonardus Franciscus Merkx

Tien Nang Pham

Jiun-Cheng Wang

Antonius Johannes Josephus Van Dijsseldonk Van Dijsseldonk

Vadim Iourievich Timoshkov

Yuri Johannes Gabrial Van De Vijver

Sylvain Dutartre

Raoul Maarten Simon Knops

A lithographic system comprises a radiation source and a lithographic apparatus. The radiation source provides radiation to the lithographic apparatus. The lithographic apparatus uses the radiation for imaging a pattern onto multiple target areas on a layer of photo-resist on a semiconductor substrate. The imaging requires a pre-determined dose of radiation. The system is controlled so as to set a level of a power of the radiation in dependence on a magnitude of the pre-determined dose.

Method for controlling a lithographic system

A lithographic apparatus including a support structure constructed to support a mask having a patterned area which is capable of imparting an EUV radiation beam with a pattern in its cross-section to form a patterned radiation beam, wherein the support structure is movable in a scanning direction, a substrate table constructed to hold a substrate, wherein the substrate table is movable in the scanning direction, and a projection system configured to project the patterned radiation beam onto an exposure region of the substrate, wherein the projection system has a demagnification in the scanning direction which is greater than a demagnification in a second direction which is perpendicular to the scanning direction and wherein the demagnification in the second direction is greater than 4&#xd7;.

Lithographic apparatus and method

A beam delivery apparatus is used with a laser produced plasma source. The beam delivery apparatus comprises variable zoom optics () operable to condition a beam of radiation so as to output a conditioned beam having a configurable beam diameter (b) and a plurality of mirrors () operable to direct the conditioned beam of radiation to a plasma generation site. The beam delivery apparatus enables control of the axial position of the beam where the beam has a particular diameter, with respect to the beam's focus position (). Also, a method is used to control the axial position of the location at a plasma generation site where a beam has a particular diameter, with respect to the beam's focus position.

Beam delivery for EUV lithography

A projection system (PS) for a lithographic apparatus comprises: an optical path (); a plurality of sensors (S-S); one or more actuators (A-A); and a controller (CN). The optical path is operable to receive an input radiation beam (Bin) and to project an output radiation beam (Bout) onto a substrate to form an image. The optical path comprises: a plurality of optical elements (M-M), the plurality of optical elements comprising: a first set of at least two optical elements (M, M) and a second set of at least one optical element (M, M). Each sensor is associated with one of the plurality of optical elements and is operable to determine a position of that optical element. Each actuator is associated with one of the second set of optical elements and is operable to adjust that optical element. The controller is operable to use the one or more actuators to adjust the second set of optical elements in dependence on the determined position of the first set of optical elements so as to at least partially compensate for optical aberrations and/or line-of-sight errors caused by the positions of the first set of optical elements.

Projection system

A lithographic apparatus for patterning a beam of radiation and projecting it onto a substrate, comprising at least two spectral purity filters configured to reduce the intensity of radiation in the beam of radiation in at least one undesirable range of radiation wavelength, wherein the two spectral purity filters are provided with different radiation filtering structures from each other.

Lithographic apparatus, spectral purity filter and device manufacturing method

A lithographic system including a lithographic apparatus with an anamorphic projection system, and a radiation source configured to generate an EUV radiation emitting plasma at a plasma formation location, the EUV radiation emitting plasma having an elongate form in a plane substantially perpendicular to an optical axis of the radiation source.

Lithographic system

A method of generating radiation for a lithography apparatus. The method comprises providing a continuously renewing fuel target () at a plasma formation location () and directing a continuous-wave excitation beam () at the plasma formation location such that fuel within the continuously renewing fuel target is excited by the continuous-wave excitation beam to a radiation generating plasma.

Method and apparatus for generating radiation

A method of exposing a patterned area on a substrate using an EUV lithographic apparatus having a demagnification of about 5&#xd7; and a numerical aperture of about 0.4 is disclosed. The method comprises exposing a first portion of the patterned area on the substrate using a first exposure, the first portion dimensions are significantly less than the dimensions of a conventional exposure, and exposing one or more additional portions of the patterned area on the substrate using one or more additional exposures, the additional portions having dimensions which are significantly less than the dimensions of a conventional exposure. The method further comprises repeating the above to expose a second patterned area on the substrate, the second patterned area being provided with the same pattern as the first patterned area, wherein a distance between center points of the first and second patterned areas corresponds with a dimension of a conventional exposure.

Lithographic method and apparatus

A radiation source for generating EUV radiation includes a laser configured to fire laser pulses at a target area to which is supplied a stream of fuel droplets, which may be tin droplets that emit EUV radiation when excited by the laser beam. The EUV radiation is collected by a collector. The tin droplets may be pre-conditioned by a laser pre-pulse before the main laser pulse to change the shape of the droplets so that the droplets are in an optimum condition for receiving the main laser pulse. Embodiments of the invention take into account the effect of the vaporization of one fuel droplet on succeeding droplets and allow the timing of the main and/or pre-pulse to be adjusted to take into account any delay in arrival of the subsequent droplet or oscillations in the shape of the subsequent droplet which may be caused by vaporization of the preceding droplet.

Radiation source

A faceted reflector (&#x2033;) for receiving an incident radiation beam () and directing a reflected radiation beam at a target. The faceted reflector comprises a plurality of facets, each of the plurality of facets comprising a reflective surface. The reflective surfaces of each of a first subset of the plurality of facets define respective parts of a first continuous surface and are arranged to reflect respective first portions of the incident radiation beam in a first direction to provide a first portion of the reflected radiation beam. The reflective surfaces of each of a second subset of the plurality of facets define respective parts of a second continuous surface and are arranged to reflect respective second portions of the incident radiation beam in a second direction to provide a second portion of the reflected radiation beam.

An actuator to displace, for example a mirror, provides movement with at least two degrees of freedom by varying the currents in two electromagnets. A moving part includes a permanent magnet with a magnetic face constrained to move over a working area lying substantially in a first plane perpendicular to a direction of magnetization of the magnet. The electromagnets have pole faces lying substantially in a second plane closely parallel to the first plane, each pole face substantially filling a quadrant of the area traversed by the face of the moving magnet. An optical position sensor may direct a beam of radiation at the moving magnet through a central space between the electromagnets. The sizes of facets in a pupil mirror device may be made smaller in a peripheral region, but larger in a central region, thereby relaxing focusing requirements.

Actuation mechanism, optical apparatus, lithography apparatus and method of manufacturing devices

A radiation source having a fuel stream generator () that generates and directs a fuel stream () along a trajectory towards a plasma formation location (). A pre-pulse laser radiation assembly directs a first beam of laser radiation () at the fuel stream at the plasma formation location to generate a modified fuel target (). A main pulse laser radiation assembly directs a second beam of laser radiation () at the modified fuel target at the plasma formation location to generate a radiation generating plasma (). A collector () collects the radiation and directs it along an optical axis () of the radiation source. The first beam of laser radiation being directed toward the fuel stream substantially along the optical axis.

A lithographic apparatus component, such as a metrology system or an optical element (e.g., a mirror) is provided with a temperature control system for controlling deformation of the component. The control system includes channels provided close to a surface of the component through which a two phase cooling medium is supplied. The metrology system measures a position of at least a moveable item with respect to a reference position and includes a metrology frame connected to the reference position. An encoder is connected to the moveable item and constructed and arranged to measure a relative position of the encoder with respect to a reference grid. The reference grid may be provided directly on a surface of the metrology frame. A lithographic projection apparatus may have the metrology system for measuring a position of the substrate table with respect to the projection system.

Lithographic apparatus and device manufacturing method

A radiation source includes a beam generator configured to generate a radiation beam to be used to produce a radiation output of the radiation source, and a beam monitor, configured to monitor the radiation beam. A lithographic apparatus includes the radiation source. A device manufacturing method includes generating a first type of radiation by utilizing a beam of a second type of radiation, monitoring a quality of the second type of radiation, and projecting a patterned beam of the first type of radiation onto a substrate.

Radiation source, lithographic apparatus and device manufacturing method

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Eindhoven, Netherlands

Jan Bernard Plechelmus Van Schoot