The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Mar. 14, 2017
Filed:
Dec. 21, 2011
Vadim Yevgenyevich Banine, Deurne, NL;
Wilhelmus Petrus DE Boeij, Veldhoven, NL;
Antonius Johannes Josephus Van Dijsseldonk Van Dijsseldonk, Hapert, NL;
Erik Roelof Loopstra, Eindhoven, NL;
Johannes Hubertus Josephina Moors, Helmond, NL;
Jan Bernard Plechelmus Van Schoot, Eindhoven, NL;
Gerardus Hubertus Petrus Maria Swinkels, Eindhoven, NL;
Andrei Mikhailovich Yakunin, Mierlo, NL;
Vadim Yevgenyevich Banine, Deurne, NL;
Wilhelmus Petrus De Boeij, Veldhoven, NL;
Antonius Johannes Josephus Van Dijsseldonk Van Dijsseldonk, Hapert, NL;
Erik Roelof Loopstra, Eindhoven, NL;
Johannes Hubertus Josephina Moors, Helmond, NL;
Jan Bernard Plechelmus Van Schoot, Eindhoven, NL;
Gerardus Hubertus Petrus Maria Swinkels, Eindhoven, NL;
Andrei Mikhailovich Yakunin, Mierlo, NL;
ASML Netherlands B.V., Veldhoven, NL;
Abstract
A lithographic apparatus for patterning a beam of radiation and projecting it onto a substrate, comprising at least two spectral purity filters configured to reduce the intensity of radiation in the beam of radiation in at least one undesirable range of radiation wavelength, wherein the two spectral purity filters are provided with different radiation filtering structures from each other.