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The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Patent No.:

US 10001709 B1

PDFFull Text
Date of Patent:
Jun. 19, 2018

Filed:

Feb. 14, 2017

Lithographic apparatus, spectral purity filter and device manufacturing method

Applicant:

Asml Netherlands B.v., Veldhoven, NL;

Inventors:

Vadim Yevgenyevich Banine, Deurne, NL;

Erik Roelof Loopstra, Eindhoven, NL;

Johannes Hubertus Josephina Moors, Helmond, NL;

Jan Bernard Plechelmus Van Schoot, Eindhoven, NL;

Gerardus Hubertus Petrus Maria Swinkels, Eindhoven, NL;

Andrei Mikhailovich Yakunin, Mierlo, NL;

Antonius Johannes Josephus Van Dijsseldonk, Hapert, NL;

Wilhelmus Petrus De Boeij, Veldhoven, NL;

Assignee:

ASML Netherlands B.V., Veldhoven, NL;

Attorney:

Sterne, Kessler, Goldstein & Fox P.L.L.C.

Primary Examiner:

Michelle M Iacoletti

Int. Cl.
CPC ...
G03F 7/20 (2006.01); G02B 5/18 (2006.01); G02B 1/11 (2015.01); G02B 5/28 (2006.01); G21K 1/06 (2006.01); H05G 2/00 (2006.01);
U.S. Cl.
CPC ...
G03F 7/70191 (2013.01); G02B 1/11 (2013.01); G02B 5/1838 (2013.01); G02B 5/281 (2013.01); G02B 5/283 (2013.01); G21K 1/062 (2013.01); G21K 1/067 (2013.01); H05G 2/005 (2013.01); H05G 2/008 (2013.01);
Abstract

A lithographic apparatus for patterning a beam of radiation and projecting it onto a substrate, comprising at least two spectral purity filters configured to reduce the intensity of radiation in the beam of radiation in at least one undesirable range of radiation wavelength, wherein the two spectral purity filters are provided with different radiation filtering structures from each other.

Find Patent Forward Citations

Banine, Vadim. (2018). Lithographic apparatus, spectral purity filter and device manufacturing method (U.S. Patent No. 10001709). U.S. Patent and Trademark Office. https://idiyas.com/patent/badge/10001709

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

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