The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Apr. 02, 2019
Filed:
Nov. 16, 2015
Asml Netherlands B.v., Veldhoven, NL;
Hans Butler, Veldhoven, NL;
Raoul Maarten Simon Knops, Veldhoven, NL;
Bob Streefkerk, Veldhoven, NL;
Christiaan Louis Valentin, Veldhoven, NL;
Jan Bernard Plechelmus Van Schoot, Veldhoven, NL;
Wilhelmus Franciscus Johannes Simons, Veldhoven, NL;
Leon Leonardus Franciscus Merkx, Veldhoven, NL;
Robertus Johannes Marinus De Jongh, Veldhoven, NL;
Roel Johannes Elisabeth Merry, Veldhoven, NL;
Michael Frederik Ypma, Veldhoven, NL;
ASML Netherlands B.V., Veldhoven, NL;
Abstract
A projection system (PS) for a lithographic apparatus comprises: an optical path (); a plurality of sensors (S-S); one or more actuators (A-A); and a controller (CN). The optical path is operable to receive an input radiation beam (Bin) and to project an output radiation beam (Bout) onto a substrate to form an image. The optical path comprises: a plurality of optical elements (M-M), the plurality of optical elements comprising: a first set of at least two optical elements (M, M) and a second set of at least one optical element (M, M). Each sensor is associated with one of the plurality of optical elements and is operable to determine a position of that optical element. Each actuator is associated with one of the second set of optical elements and is operable to adjust that optical element. The controller is operable to use the one or more actuators to adjust the second set of optical elements in dependence on the determined position of the first set of optical elements so as to at least partially compensate for optical aberrations and/or line-of-sight errors caused by the positions of the first set of optical elements.