Robertus Johannes Marinus De Jongh

USPTO Granted Patents = 11 (Patent Applications = 3)

Average Co-Inventor Count = 3.9

ph-index = 3

Forward Citations = 20(Granted Patents)

Location History:

Eindhoven, NL (2006 - 2018)
Veldhoven, NL (2019)
Boxmeer, NL (2023)

Company Filing History:

11 out of 4,883

Asml Netherlands B.v.

where one patent can have more than one assignee

Years Active: 2006-2023

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11 patents (USPTO):Sort by Forward CitationsExplore Patents

1. 11550227 - Projection system and lithographic apparatus comprising said projection system (2023-01-10),

2. 10248027 - Projection system (2019-04-02),

3. 9857698 - Lithographic apparatus and device manufacturing method (2018-01-02),

4. 9304404 - Arrangement for actuating an element in a microlithographic projection exposure apparatus (2016-04-05),

5. 9164401 - Projection system and lithographic apparatus (2015-10-20),

6. 9122173 - Positioning system, lithographic apparatus and device manufacturing method (2015-09-01),

7. 8908144 - Lithographic apparatus and device manufacturing method (2014-12-09),

8. 8144310 - Positioning system, lithographic apparatus and device manufacturing method (2012-03-27),

9. 7307262 - Lithographic apparatus and device manufacturing method (2007-12-11),

10. 7224428 - Lithographic apparatus and device manufacturing method (2007-05-29),

11. 6992752 - Lithographic projection apparatus, computer program for control thereof, and device manufacturing method (2006-01-31),

Title: The Innovative Mind of Robertus Johannes Marinus De Jongh

Introduction:

Robertus Johannes Marinus De Jongh is a prolific inventor based in Eindhoven, Netherlands. With an impressive portfolio of 11 patents, he has made significant contributions to the field of projection systems and lithographic apparatus.

Latest Patents:

One of De Jongh's latest patents is a cutting-edge projection system designed for lithographic apparatus. This system comprises optical elements that direct a beam along a specified path, with a control system that can detect and correct deformations in the optical elements. By precisely controlling the position of various optical elements, the system ensures accurate patterning on objects placed on an object support.

Career Highlights:

Throughout his career, De Jongh has worked with renowned companies such as ASML Netherlands B.V. and Carl Zeiss SMT GmbH. His expertise and innovative solutions have been instrumental in advancing the capabilities of lithographic equipment used in semiconductor manufacturing.

Collaborations:

During his tenure at these companies, De Jongh collaborated closely with industry experts and fellow innovators. Notable coworkers include Hans Butler and Maurice Willem Jozef Etiënne Wijckmans, who have contributed to the success of various projects in the field of lithography.

Conclusion:

Robertus Johannes Marinus De Jongh's dedication to innovation and his remarkable contributions to the development of projection systems and lithographic apparatus have solidified his reputation as a visionary inventor in the industry. With a keen eye for detail and a passion for pushing boundaries, De Jongh continues to inspire future generations of inventors and engineers in the field of advanced optics and imaging technologies.

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3 patents pending:

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