The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Mar. 27, 2012

Filed:

Mar. 24, 2009
Applicants:

Hans Butler, Best, NL;

Martinus Agnes Willem Cuijpers, Veldhoven, NL;

Christiaan Alexander Hoogendam, Westerhoven, NL;

Robertus Johannes Marinus DE Jongh, Eindhoven, NL;

Michael Jozef Mathijs Renkens, Sittard, NL;

Marc Wilhelmus Maria Van Der Wijst, Veldhoven, NL;

Maurice Willem Jozef Etiënne Wijckmans, Eindhoven, NL;

Robertus Leonardus Tousain, Eindhoven, NL;

Ronald Petrus Hendricus Faassen, Oss, NL;

Adrianus Hendrik Koevoets, Mierlo, NL;

Assignee:

ASML Netherlands B.V., Veldhoven, NL;

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
G03B 27/58 (2006.01); G03B 27/42 (2006.01);
U.S. Cl.
CPC ...
Abstract

A positioning system to position a table within a base frame of a lithographic apparatus, the positioning system including first and second actuators and a controller. The first actuator exerting an actuation force on the table. The first actuator being connected to a balance mass constructed and arranged to absorb a reaction force of the first actuator. The controller and second actuator constructed and arranged to exert a compensation force and/or torque to compensate a torque caused by the actuation force exerted by the first actuator on the balance mass.


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