The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Oct. 20, 2015
Filed:
Jul. 17, 2009
Erik Roelof Loopstra, Eindhoven, NL;
Wilhelmus Petrus DE Boeij, Veldhoven, NL;
Hans Butler, Best, NL;
Robertus Johannes Marinus DE Jongh, Eindhoven, NL;
Jan Bernard Plechelmus Van Schoot, Eindhoven, NL;
Timotheus Franciscus Sengers, 's-Hertogenbosch, NL;
Maurice Willem Jozef Etiënne Wijckmans, Eindhoven, NL;
Franciscus Johannes Joseph Janssen, Geldrop, NL;
Erik Roelof Loopstra, Eindhoven, NL;
Wilhelmus Petrus De Boeij, Veldhoven, NL;
Hans Butler, Best, NL;
Robertus Johannes Marinus De Jongh, Eindhoven, NL;
Jan Bernard Plechelmus Van Schoot, Eindhoven, NL;
Timotheus Franciscus Sengers, 's-Hertogenbosch, NL;
Maurice Willem Jozef Etiënne Wijckmans, Eindhoven, NL;
Franciscus Johannes Joseph Janssen, Geldrop, NL;
ASML Netherlands B.V., Veldhoven, NL;
Abstract
A projection system (PS) is provided which includes, in an embodiment, two frames. The optical elements of the projection system are mounted on a first frame (). The position of the optical elements is measured relative to a second frame () using a first measurement system (). A second measurement system () is used to measure a parameter associated with a deformation of the second frame. The measurement made by the second measurement system can be used to compensate for any errors in the position of the optical elements as measured by the first measurement system resulting from deformations of the second frame. Typically, deformations of the frames are due to resonant oscillation and thermal expansion. Having two frames enables the optical elements of the projection system to be positioned with a high degree of accuracy. Optionally, a temperature control system () may be provided to drive the temperature of at least one of the frames back to a desired value after the lithographic apparatus has been taken off line.