The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Dec. 09, 2014
Filed:
Sep. 27, 2006
Rogier Herman Mathijs Groeneveld, Eindhoven, NL;
Antonius Johannes Josephus Van Dijsseldonk, Hapert, NL;
Dominicus Jacobus Petrus Adrianus Franken, Veldhoven, NL;
Bastiaan Stephanus Hendricus Jansen, Waalre, NL;
Robertus Johannes Marinus DE Jongh, Eindhoven, NL;
Marc Wilhelmus Maria Van Der Wijst, Veldhoven, NL;
Maurice Willem Jozef Etiënne Wijckmans, Eindhoven, NL;
Rogier Herman Mathijs Groeneveld, Eindhoven, NL;
Antonius Johannes Josephus Van Dijsseldonk, Hapert, NL;
Dominicus Jacobus Petrus Adrianus Franken, Veldhoven, NL;
Bastiaan Stephanus Hendricus Jansen, Waalre, NL;
Robertus Johannes Marinus De Jongh, Eindhoven, NL;
Marc Wilhelmus Maria Van Der Wijst, Veldhoven, NL;
Maurice Willem Jozef Etiënne Wijckmans, Eindhoven, NL;
ASML Netherlands B.V., Veldhoven, NL;
Abstract
A lithographic apparatus is disclosed that includes a support constructed to support a patterning device, the patterning device being capable of imparting a radiation beam with a pattern in its cross-section to form a patterned radiation beam and a substrate table constructed to hold a substrate. Further, the lithographic apparatus includes a projection system configured to project the patterned radiation beam onto a target portion of the substrate, the projection system being mounted to a reference element of the lithographic apparatus by a resilient mount to reduce a transfer of high frequency vibration from the reference element to the projection system and a control system to counteract a position error of the substrate table and the support relative to the projection system.