Company Filing History:

26 out of 4,883

Asml Netherlands B.v.

Amsl Netherlands B.v.

patents

where one patent can have more than one assignee

Years Active: 2004-2014

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27 patents (USPTO):Sort by Forward Citations

Abstract keywords

1. 8908144 - Lithographic apparatus and device manufacturing method (2014-12-09),

2. 8159647 - Lithographic apparatus and device manufacturing method (2012-04-17),

3. 7999914 - Lithographic apparatus and device manufacturing method (2011-08-16),

4. 7804584 - Integrated circuit manufacturing methods with patterning device position determination (2010-09-28),

5. 7525637 - Assembly (2009-04-28),

6. 7508494 - Lithographic apparatus and a subtrate table for exciting a shockwave in a substrate (2009-03-24),

7. 7474384 - Lithographic apparatus, device manufacturing method, and a projection element for use in the lithographic apparatus (2009-01-06),

8. 7474378 - Assembly, a lithographic apparatus, and a device manufacturing method (2009-01-06),

9. 7471373 - Lithographic apparatus with patterning device position determination (2008-12-30),

10. 7460208 - Lithographic apparatus and device manufacturing method (2008-12-02),

11. 7436484 - Lithographic apparatus and device manufacturing method (2008-10-14),

12. 7411652 - Lithographic apparatus and device manufacturing method (2008-08-12),

13. 7397531 - Lithographic apparatus and device manufacturing method (2008-07-08),

14. 7362415 - Lithographic apparatus and device manufacturing method (2008-04-22),

15. 7307262 - Lithographic apparatus and device manufacturing method (2007-12-11),

Title: Unveiling the Innovations of Dominicus Jacobus Petrus Adrianus Franken

Introduction: Dominicus Jacobus Petrus Adrianus Franken, a visionary inventor based in Veldhoven, NL, has left an indelible mark in the field of lithographic technology with a remarkable portfolio of 27 patents.

Latest Patents:

1. "Lithographic apparatus and device manufacturing method": This groundbreaking invention showcases Franken's expertise in developing a lithographic apparatus with advanced features to enhance precision and efficiency in device manufacturing.

2. "Maskless lithography system": Franken's innovative approach to reducing global unflatness in patterning arrays has significantly improved the telecentricity error in lithography systems.

Career Highlights: Franken's illustrious career includes notable stints at renowned companies such as ASML Netherlands B.V. and ASML Holding N.V., where he honed his skills and contributed significantly to the technological advancements in the industry.

Collaborations: Throughout his career, Franken had the privilege of collaborating with esteemed professionals in the field, including Marc Wilhelmus Maria Van Der Wijst and Erik Roelof Loopstra. These collaborations have fostered a culture of innovation and knowledge exchange, leading to remarkable advancements in lithographic technology.

Conclusion: Dominicus Jacobus Petrus Adrianus Franken's relentless pursuit of innovation and his exceptional contributions to the field of lithography have cemented his legacy as a pioneering inventor. His patents reflect his unwavering commitment to pushing the boundaries of technological possibilities, inspiring future generations to strive for excellence in the realm of inventions.

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3 patents (EPO):

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