The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Dec. 30, 2008
Filed:
Jun. 25, 2004
Petrus Rutgerus Bartray, Ysselsteyn, NL;
Wilhelmus Josephus Box, Vennenstraat 3A, BE;
Dominicus Jacobus Petrus Adrianus Franken, Veldhoven, NL;
Bernardus Antonius Johannes Luttikhuis, Nuenen, NL;
Engelbertus Antonius Franciscus Van Der Pasch, Oirschot, NL;
Marc Wilhelmus Maria Van Der Wijst, Veldhoven, NL;
Marc Johannes Martinus Engels, Helden, NL;
Petrus Rutgerus Bartray, Ysselsteyn, NL;
Wilhelmus Josephus Box, Vennenstraat 3A, BE;
Dominicus Jacobus Petrus Adrianus Franken, Veldhoven, NL;
Bernardus Antonius Johannes Luttikhuis, Nuenen, NL;
Engelbertus Antonius Franciscus Van Der Pasch, Oirschot, NL;
Marc Wilhelmus Maria Van Der Wijst, Veldhoven, NL;
Marc Johannes Martinus Engels, Helden, NL;
ASML Netherlands B.V., Veldhoven, NL;
Abstract
A lithographic apparatus is disclosed. The apparatus includes a radiation system for supplying a beam of radiation, and a support structure for supporting a patterning device. The patterning device serves to pattern the beam of radiation according to a desired pattern. The apparatus also includes a projection system for projecting the patterned beam of radiation onto a target portion of a substrate, and an assembly for determining a spatial position of the patterning device relative to the projection system. The assembly includes a measuring unit that has a plurality of sensors that are mounted on the projection system.