The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Aug. 16, 2011
Filed:
Apr. 24, 2008
Marc Wilhelmus Maria Van Der Wijst, Veldhoven, NL;
Dominicus Jacobus Petrus Adrianus Franken, Veldhoven, NL;
Erik Roelof Loopstra, Heeze, NL;
Marius Ravensbergen, Bergeijk, NL;
Marc Wilhelmus Maria Van Der Wijst, Veldhoven, NL;
Dominicus Jacobus Petrus Adrianus Franken, Veldhoven, NL;
Erik Roelof Loopstra, Heeze, NL;
Marius Ravensbergen, Bergeijk, NL;
ASML Netherlands B.V., Veldhoven, NL;
Abstract
A lithographic apparatus is disclosed having a deformable lens element through which a patterned radiation beam is arranged to pass before reaching a substrate and having a deformable lens actuator configured to transmit a combination of a force substantially parallel to the optical axis of the projection system and a localized torque about an axis substantially perpendicular to the optical axis independently at a plurality of sub-regions on the deformable lens element.