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For the Inventor, By the Inventor

Bergeijk, Netherlands

Marius Ravensbergen

This inventor holds 10 USPTO granted patents and 1 EPO patent. Top assignees: Asml Netherlands B.v., Carl-Zeiss-Smt Ag. Active years: 2004-2013.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Marius Ravensbergen. Retrieved from https://idiyas.com/inventor/marius-ravensbergen

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

USPTO Granted Patents = 10

% Patents Active = 40.0


Average Co-Inventor Count = 3.0

ph-index = 3

Forward Citations = 49(Granted Patents)


Location History:

  • Bergeljk, NL (2011)
  • Bergeijk, NL (2004 - 2013)

Company Filing History:

goldMedal10 out of 5,070 
 
Asml Netherlands B.v.
 patents
silverMedal1 out of 461 
 
Carl-Zeiss-Smt Ag
 patents
where one patent can have more than one assignee

Years Active: 2004-2013

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10 patents (USPTO):Explore Patents
1. 8537330 - Lithographic apparatus, device manufacturing method and computer readable medium (2013-09-17),
2. 8089672 - Array element device control method and apparatus (2012-01-03),
3. 8052289 - Mirror array for lithography (2011-11-08),
4. 7999914 - Lithographic apparatus and device manufacturing method (2011-08-16),
5. 7800079 - Assembly for detection of radiation flux and contamination of an optical component, lithographic apparatus including such an assembly and device manufacturing method (2010-09-21),
6. 7525640 - Lithographic apparatus and device manufacturing method (2009-04-28),
7. 7436484 - Lithographic apparatus and device manufacturing method (2008-10-14),
8. 7423721 - Lithographic apparatus (2008-09-09),
9. 7375353 - Lithographic apparatus and device manufacturing method (2008-05-20),
10. 6819400 - Lithographic apparatus and device manufacturing method (2004-11-16),

Title: The Innovative Journey of Marius Ravensbergen in the Field of Lithography

Introduction: Marius Ravensbergen, a talented inventor hailing from Bergeijk, Netherlands, has made a significant mark in the field of lithography with his valuable contributions and a total of 10 patented inventions.

Latest Patents: Among his recent patents is a groundbreaking invention in lithographic apparatus, device manufacturing methods, and computer-readable mediums. This invention involves a unique concept where a part of a reflector is heated and cooled, with the rate of heating and/or cooling adjusted to modify the temperature of the part. This temperature change exerts a force on the reflector, altering its shape. Another notable patent is his array element device control method and apparatus, which involves varying the frequency of a driving voltage to control individual elements in an array.

Career Highlights: Marius Ravensbergen has worked with renowned companies such as ASML Netherlands B.V. and Carl Zeiss SMT AG, where his innovative spirit and technical expertise have truly shone. His contributions to the development of cutting-edge technologies have been invaluable to the industry.

Collaborations: Throughout his career, Marius has collaborated with industry experts and talented individuals, including Erik Roelof Loopstra and Marc Wilhelmus Maria Van Der Wijst. Together, they have worked on pushing the boundaries of technological advancements in lithography and beyond.

Conclusion: Marius Ravensbergen's journey as an inventor showcases his passion for innovation and his commitment to pushing the boundaries of what is possible in the field of lithography. His numerous patents and collaborations stand as a testament to his remarkable contributions, and he continues to inspire future generations of inventors with his groundbreaking work.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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