Asml Netherlands B.v.

Carl-Zeiss-Smt Ag

Marius Ravensbergen

Erik Roelof Loopstra

Marc Wilhelmus Maria Van Der Wijst

Heine Melle Mulder

Dominicus Jacobus Petrus Adrianus Franken

Vadim Yevgenyevich Banine

Patricius Aloysius Jacobus Tinnemans

Johannes Henricus Wilhelmus Jacobs

Johannes Hubertus Josephina Moors

Levinus Pieter Bakker

Markus Hauf

Marcel Mathijs Theodore Marie Dierichs

Franciscus Johannes Joseph Janssen

Hernes Jacobs

Wilhelmus Josephus Box

Antonius Johannes Josephus Van Dijsseldonk

Lucas Henricus Johannes Stevens

Hako Botma

Hendrik Antony Johannes Neerhof

Martinus Arnoldus Henricus Terken

Wilfred Edward Endendijk

Robert Gordon Livesey

Bastiaan Stephanus Hendricus Jansen

Jozef Ferdinand Dymphna Verbeeck

Mustafa Amhaouch

Franciscus Catharina Bernardus Marinus Van Vroonhoven

Yurii Victorvitch Sidelnikov

Markus Josef Hauf

In a lithographic apparatus, a part of a reflector is heated and cooled. The rate of heating and/or the rate of cooling is adjusted to adjust the temperature of the part. The change in temperature of the part exerts a force on the reflector, which changes its shape.

Lithographic apparatus, device manufacturing method and computer readable medium

A method of controlling an element of an array of individually controllable elements. The method includes varying a frequency of a driving voltage with which the element is driven.

Array element device control method and apparatus

A mirror array apparatus includes a carrier configured to support a plurality of individually adjustable reflective elements. At least one actuator is associated with each reflective element, the actuator being configured to adjust the orientation or position of the associated reflective element. The apparatus further includes a liquid in contact with at least a portion of the reflective elements.

Mirror array for lithography

A lithographic apparatus is disclosed having a deformable lens element through which a patterned radiation beam is arranged to pass before reaching a substrate and having a deformable lens actuator configured to transmit a combination of a force substantially parallel to the optical axis of the projection system and a localized torque about an axis substantially perpendicular to the optical axis independently at a plurality of sub-regions on the deformable lens element.

Lithographic apparatus and device manufacturing method

An assembly for detection of at least one of radiation flux and contamination on an optical component includes a detector configured to receive at least one of the radiation flux and contamination, and when the assembly is in use, to generate a detector signal correlated to at least one of the radiation flux and contamination on the component. A meter is configured to measure the detector signal. The detector includes at least one wire.

Assembly for detection of radiation flux and contamination of an optical component, lithographic apparatus including such an assembly and device manufacturing method

A lithographic apparatus is disclosed that includes an optical arrangement having an array of optical elements arranged in a plane perpendicular to the radiation beam. Each optical element comprises an electrical heating device to change an optical path length of the radiation beam. By selectively actuating the electrical heating devices, a position dependent change in optical path length can be achieved in order to correct for irradiation-induced optical path length errors.

A vacuum operated lithographic apparatus includes a vacuum housing for providing a vacuum environment to a support constructed to support a patterning device, or a substrate table, or a projection system, or any combination thereof. An interior of the vacuum housing includes a plurality of transport circuits for transporting fluids and/or electrical signals for use in a first process mode for lithographic processing. At least one of the transport circuits is adapted to transport energy towards the interior of the vacuum housing to stimulate outgassing in the vacuum housing for use in a second process mode for bringing the lithographic apparatus into a vacuum operating condition.

Lithographic apparatus

An attenuation adjustment device is disclosed that includes a plurality of members configured to cast penumbras in a radiation beam illuminating a patterning device in a lithography apparatus. Furthermore, an attenuation control device is provided to adjust the members in such a manner as to control the attenuation of the patterned radiation beam projected onto a target portion of a substrate across the cross-section of the patterned radiation beam. The attenuation control device includes a detector configured to provide an output indicative of the position of each member in dependence on detection of a beam of detecting radiation reaching the detector after attenuation by the member.

A displacement measurement system constructed and arranged to measure the position of optical elements in a projection system of a lithographic projection apparatus makes use of the interferential measurement principle which involves use of a first diffraction grating mounted on the optical element and a second diffraction grating mounted on a reference frame.

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Bergeijk, Netherlands

Marius Ravensbergen