The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Nov. 16, 2004

Filed:

Mar. 13, 2003
Applicant:
Inventor:

Marius Ravensbergen, Bergeijk, NL;

Assignee:

ASMl Netherlands B.V., Veldhoven, NL;

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
G03B 2/752 ; G03B 2/754 ;
U.S. Cl.
CPC ...
G03B 2/752 ; G03B 2/754 ;
Abstract

A displacement measurement system constructed and arranged to measure the position of optical elements in a projection system of a lithographic projection apparatus makes use of the interferential measurement principle which involves use of a first diffraction grating mounted on the optical element and a second diffraction grating mounted on a reference frame.


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