The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Sep. 09, 2008
Filed:
Dec. 15, 2004
Antonius Johannes Josephus Van Dijsseldonk, Hapert, NL;
Mustafa Amhaouch, Helden Panningen, NL;
Wilhelmus Josephus Box, Eksel, BE;
Johannes Henricus Wilhelmus Jacobs, Eindhoven, NL;
Hernes Jacobs, Eindhoven, NL;
Marius Ravensbergen, Bergeijk, NL;
Martinus Arnoldus Henricus Terken, Lierop, NL;
Robert Gordon Livesey, West Sussex, GB;
Franciscus Catharina Bernardus Marinus Van Vroonhoven, Eindhoven, NL;
Antonius Johannes Josephus Van Dijsseldonk, Hapert, NL;
Mustafa Amhaouch, Helden Panningen, NL;
Wilhelmus Josephus Box, Eksel, BE;
Johannes Henricus Wilhelmus Jacobs, Eindhoven, NL;
Hernes Jacobs, Eindhoven, NL;
Marius Ravensbergen, Bergeijk, NL;
Martinus Arnoldus Henricus Terken, Lierop, NL;
Robert Gordon Livesey, West Sussex, GB;
Franciscus Catharina Bernardus Marinus Van Vroonhoven, Eindhoven, NL;
ASML Netherlands B.V., Veldhoven, NL;
Abstract
A vacuum operated lithographic apparatus includes a vacuum housing for providing a vacuum environment to a support constructed to support a patterning device, or a substrate table, or a projection system, or any combination thereof. An interior of the vacuum housing includes a plurality of transport circuits for transporting fluids and/or electrical signals for use in a first process mode for lithographic processing. At least one of the transport circuits is adapted to transport energy towards the interior of the vacuum housing to stimulate outgassing in the vacuum housing for use in a second process mode for bringing the lithographic apparatus into a vacuum operating condition.