The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Apr. 28, 2009
Filed:
Nov. 07, 2006
Bastiaan Stephanus Hendricus Jansen, Waalre, NL;
Erik Roelof Loopstra, Heeze, NL;
Marius Ravensbergen, Bergeijk, NL;
Markus Josef Hauf, Ichenhausen, DE;
Bastiaan Stephanus Hendricus Jansen, Waalre, NL;
Erik Roelof Loopstra, Heeze, NL;
Marius Ravensbergen, Bergeijk, NL;
Markus Josef Hauf, Ichenhausen, DE;
ASML Netherlands B.V., Veldhoven, NL;
Carl Zeiss SMT AG, Oberkochen, DE;
Abstract
A lithographic apparatus is disclosed that includes an optical arrangement having an array of optical elements arranged in a plane perpendicular to the radiation beam. Each optical element comprises an electrical heating device to change an optical path length of the radiation beam. By selectively actuating the electrical heating devices, a position dependent change in optical path length can be achieved in order to correct for irradiation-induced optical path length errors.