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For the Inventor, By the Inventor

Oberkochen, Germany

Carl-Zeiss-Smt Ag


USPTO Granted Patents = 461


Trademarks = 3

Forward Citations = 4,932

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475 inventors (with patents filed for the assignee):

goldMedal Wilhelm Ulrich (61 out of 133 patents)

silverMedal Wolfgang Singer (60 out of 120 patents)

bronzeMedal Karl-Heinz Schuster (47 out of 98 patents)

4.  Johannes Wangler (37 out of 83 patents)

5.  Alexander Epple (34 out of 84 patents)

6.  Toralf Gruner (33 out of 128 patents)

7.  Aurelian Dodoc (27 out of 67 patents)

8.  Hubert Holderer (26 out of 61 patents)

9.  Ulrich Wegmann (23 out of 44 patents)

10.  Hans-Juergen Mann (23 out of 119 patents)

11.  Martin Antoni (23 out of 31 patents)

12.  Bernhard Gellrich (22 out of 53 patents)

13.  Udo Dinger (19 out of 45 patents)

14.  Markus Weiss (18 out of 23 patents)

15.  Hans-Juergen Rostalski (17 out of 35 patents)


Core Competencies:
Photolithography
Lithographic Apparatus
EUV Lithography
Microlithography
Optical Elements
Illumination Systems
Projection Objectives
Optical Imaging
Holography
Vibration Damping
Optical Composite Materials
Image Quality Measurement

461 patents:

1. 9933707 - Optical apparatus for use in photolithography (2018-04-03),
2. 8861084 - Polarization-modulating optical element (2014-10-14),
3. 8860922 - Lithographic apparatus and device manufacturing method (2014-10-14),
4. 8810771 - Lithographic apparatus and device manufacturing method (2014-08-19),
5. 8711330 - Lithographic apparatus and device manufacturing method (2014-04-29),
6. 8570486 - Lithographic apparatus and device manufacturing method (2013-10-29),
7. 8174674 - Lithographic apparatus and device manufacturing method (2012-05-08),
8. 8102502 - Lithographic apparatus and device manufacturing method (2012-01-24),
9. 8094287 - Lithographic appararus and method (2012-01-10),
10. 7986472 - Optical element module (2011-07-26),
11. 7952685 - Illuminator for a lithographic apparatus and method (2011-05-31),
12. 7911598 - Method for cleaning an EUV lithography device, method for measuring the residual gas atmosphere and the contamination and EUV lithography device (2011-03-22),
13. 7907347 - Optical composite material and method for its production (2011-03-15),
14. RE42118 - Projection system for EUV lithography (2011-02-07),
15. 7884922 - Illumination system for microlithography (2011-02-08),
Carl Zeiss SMT AG is a leading provider of optical and electron-beam lithography equipment for the semiconductor industry. With a focus on precision and quality, they offer cutting-edge solutions for semiconductor manufacturing. Their technology enables customers to achieve high-resolution imaging and precise patterning. Zeiss SMT AG is committed to driving innovation in the semiconductor industry and helping customers achieve success in their production processes.
This text is generated by artificial intelligence and may not be accurate.

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USPTO Data Jan 1 1976 - Jan 6 2026

461 Patents

#3 in Oberkochen

#130 in Germany

#2,004 in the World

...
Oberkochen, Germany

Carl-Zeiss-Smt Ag

Forward Citations = 4,932

475 inventors:

goldMedal Wilhelm Ulrich (61 out of 133 patents)

silverMedal Wolfgang Singer (60 out of 120 patents)

bronzeMedal Karl-Heinz Schuster (47 out of 98 patents)

4.  Johannes Wangler (37 out of 83 patents)

5.  Alexander Epple (34 out of 84 patents)

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