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For the Inventor, By the Inventor

Aalen-Hofen, Germany

Toralf Gruner

USPTO Granted Patents = 128 

 

Average Co-Inventor Count = 3.7

ph-index = 10

Forward Citations = 470(Granted Patents)

Forward Citations (Not Self Cited) = 400(Oct 12, 2025)


Inventors with similar research interests:


Location History:

  • Oberkochen, DE (2003)
  • Koenigsbronn, DE (2004 - 2005)
  • Chemnitz, DE (2004 - 2006)
  • Königsbronn, DE (2005 - 2006)
  • Aalen-Hofen, GB (2010)
  • Aalen-Hofen, DE (2006 - 2024)
  • Aalen, DE (2007 - 2024)

Company Filing History:

goldMedal91 out of 1,405 
 
Carl Zeiss Smt Gmbh
 patents
silverMedal33 out of 461 
 
Carl-zeiss-smt Ag
 patents
bronzeMedal3 out of 83 
 
Carl Zeiss Sms Ltd.
 patents
4. 1 out of 22 
 
Carl Zeiss Semiconductor Manufacturing Technologies Ag
 patents
5. 1 out of 832,680 
Other
 patents
where one patent can have more than one assignee

Years Active: 2003-2025

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128 patents (USPTO):Explore Patents
1. 12436361 - Projection exposure apparatus for semiconductor lithography (2025-10-07),
2. 12411417 - Projection objective including an optical device (2025-09-09),
3. 12339587 - Facet assembly for a facet mirror (2025-06-24),
4. 12271117 - Support for an optical element (2025-04-08),
5. 12222655 - Stop, optical system and lithography apparatus (2025-02-11),
6. 12210289 - Mirror, in particular for a microlithographic projection exposure apparatus (2025-01-28),
7. 11927500 - Method and device for characterizing the surface shape of an optical element (2024-03-12),
8. 11906904 - Projection exposure method and projection lens with setting of the pupil transmission (2024-02-20),
9. 11809085 - Mirror, in particular for a microlithographic projection exposure apparatus (2023-11-07),
10. 11415895 - Compensation of creep effects in an imaging device (2022-08-16),
11. 11366395 - Mirror, in particular for a microlithographic projection exposure system (2022-06-21),
12. 11360393 - Mirror, in particular for a microlithographic projection exposure system (2022-06-14),
13. 11320314 - Method and device for determining the heating state of an optical element in an optical system for microlithography (2022-05-03),
14. 11187990 - Mirror for a microlithographic projection exposure apparatus, and method for operating a deformable mirror (2021-11-30),
15. 11156922 - Method and device for determining the heating state of a mirror in an optical system (2021-10-26),

Title: The Innovative Journey of Toralf Gruner

Introduction: Toralf Gruner, a pioneering inventor hailing from Aalen-Hofen, Germany, has made significant contributions to the world of technology and innovation through his groundbreaking inventions.

Latest Patents: Toralf Gruner's latest patents focus on renewable energy solutions, including a solar panel design that maximizes energy efficiency and a wind turbine technology that enhances power generation capabilities.

Career Highlights: With a career spanning over two decades, Toralf Gruner has established himself as a leading figure in the field of sustainable energy technologies. His innovative approaches have led to numerous patents that have revolutionized the renewable energy sector.

Collaborations: Throughout his career, Toralf Gruner has collaborated with top research institutions and leading companies in the renewable energy industry to further develop and implement his inventions. His partnerships have been instrumental in bringing his innovative ideas to life.

Conclusion: Toralf Gruner's passion for innovation and commitment to creating a more sustainable future have solidified his reputation as a visionary inventor. His contributions to the field of renewable energy continue to inspire and drive positive change in the world.

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