The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Feb. 11, 2025

Filed:

Dec. 17, 2021
Applicant:

Carl Zeiss Smt Gmbh, Oberkochen, DE;

Inventors:

Benjahman Julius Modeste, Elchingen, DE;

Toralf Gruner, Aalen-Hofen, DE;

Daniel Golde, Oberkochen, DE;

Ulrich Loering, Ulm, DE;

Ralf Zweering, Aalen, DE;

Stefan Xalter, Oberkochen, DE;

Assignee:

Carl Zeiss SMT GmbH, Oberkochen, DE;

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
G03F 7/20 (2006.01); G02B 5/00 (2006.01); G03F 7/00 (2006.01); G02B 17/08 (2006.01);
U.S. Cl.
CPC ...
G03F 7/7025 (2013.01); G02B 5/005 (2013.01); G02B 17/0848 (2013.01); G02B 17/0892 (2013.01);
Abstract

A stop, such as a numerical aperture stop, obscuration stop or false-light stop, for a lithography apparatus, includes a light-transmissive aperture and a stop element, in which or at which the aperture is provided. The stop element is opaque and fluid-permeable outside the aperture.


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