This inventor holds 30 USPTO granted patents and 4 published patent applications and 4 EPO patents, primarily in EUV Lithography. Top assignees: Carl Zeiss Smt Gmbh, Asml Netherlands B.v., Carl-Zeiss-Smt Ag. Active years: 2008-2025.
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile
Location History:
- Oberkochen, DE (2008 - 2013)
- Schwaebisch Gmuend, DE (US) (2014)
- Schwaebisch Gmuend, DE (2012 - 2020)
Company Filing History:
25 out of 1,479 
5 out of 5,075 
5 out of 461 Years Active: 2008-2025
Areas of Expertise:
Title: Innovator Spotlight: Ulrich Loering - Revolutionizing EUV Lithography
Introduction:
Ulrich Loering, a prominent inventor based in Schwaebisch Gmuend, Germany, has made a significant impact in the field of EUV lithography with his groundbreaking inventions and patents. With a remarkable portfolio of 28 patents, Loering has demonstrated a keen understanding of optical systems and precision engineering.
Latest Patents:
Loering's recent patents showcase his expertise in EUV exposure apparatus and microlithographic projection exposure systems. One of his notable inventions includes an EUV exposure apparatus with reflective elements designed to minimize the influence of temperature variation, ensuring consistent performance in lithographic projection. Additionally, his work on a measuring device for a projection lens in immersion operation highlights his commitment to enhancing the stability and reliability of optical systems in advanced lithography.
Career Highlights:
Throughout his career, Ulrich Loering has been associated with renowned companies in the industry, including Carl Zeiss SMT GmbH and Carl Zeiss SMT AG. His tenure at these esteemed organizations has provided him with the opportunity to collaborate with leading experts and contribute to cutting-edge technological advancements in the field of optical imaging and lithography.
Collaborations:
Loering's innovative spirit is further fueled by collaborations with accomplished colleagues such as Norbert Wabra and Wilhelm Ulrich. Together, they have pushed the boundaries of optical design and precision manufacturing, setting new standards for performance and efficiency in lithographic systems.
Conclusion:
In conclusion, Ulrich Loering stands out as a visionary inventor who continues to redefine the possibilities of EUV lithography through his pioneering work. With a wealth of experience and a passion for innovation, Loering remains at the forefront of technological advancements in optical imaging, inspiring the next generation of inventors and engineers to push the boundaries of what is possible in the world of lithography.
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile