The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jul. 24, 2018
Filed:
Jul. 14, 2017
Carl Zeiss Smt Gmbh, Oberkochen, DE;
Asml Netherlands B.v., Veldhoven, NL;
Norman Baer, Aalen, DE;
Ulrich Loering, Schwaebisch Gmuend, DE;
Oliver Natt, Aalen, DE;
Gero Wittich, Aalen, DE;
Timo Laufer, Stuttgart, DE;
Peter Kuerz, Aalen, DE;
Guido Limbach, Aalen, DE;
Stefan Hembacher, Bobingen, DE;
Holger Walter, Abtsgmuend, DE;
Yim-Bun-Patrick Kwan, Aalen, DE;
Markus Hauf, Ulm, DE;
Franz-Josef Stickel, Aalen, DE;
Jan Van Schoot, Eindhoven, NL;
Carl Zeiss SMT GmbH, Oberkochen, DE;
ASML Netherlands B.V., Veldhoven, NL;
Abstract
A projection lens of an EUV-lithographic projection exposure system with at least two reflective optical elements each comprising a body and a reflective surface for projecting an object field on a reticle onto an image field on a substrate if the projection lens is exposed with an exposure power of EUV light, wherein the bodies of at least two reflective optical elements comprise a material with a temperature dependent coefficient of thermal expansion which is zero at respective zero cross temperatures, and wherein the absolute value of the difference between the zero cross temperatures is more than 6K.